스퍼터링을 이용한 폴리머 기판의 고기능 수분 차단층에 관한 연구

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규채 연
4 years ago
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1 g/m 2 day atm 이하, 산소투과율이 10-3 cm 3 /m 2 day atm 이하로낮추어야유연한 플라스틱기판에서활용이가능하다.

2 Barrier requirements for different product sectors[4] Application Required properties of encapsulation material Water vapor Oxygen Other requirement Permeability Permeability Encapsulation of Solar modules <0.01 [g/m 2 day atm] not relevant [cm 3 /m 2 day atm] spectral transmittance VIP (vacuum insulating panels) < high reflectance for thermal radiation LED displays OLED displays <0.01~0.1 <10-6 <0.01~0.1 <10-3 transparency in the visible spectral region

3 OLED Coating Barrier layer Planarizing layer Flexible Plastic Film

5 Low partial pressure side P1 C1 C2 A High partial pressure side P2 d

6 D p S

7 cm 3 /m day atm cm 3 /m 2 day atm

9 또는

11 와 이다 g/m 2 day atm을

12 cm 3 /m 2 day atm cm 3 /m 2 day atm

13 100 q H /t(r 0 =1) d q H /t (d=1) R 0

15 r LV cosθ 기체 r SV θ r SL 액체 고체

16 PES Glass

20 Transmittance [%] Tranmittance Reflectance Reflectance [%] Wavelength [nm] 10 Loss { 100-(T+R)} [%] PES Glass PES Glass Wavelength [%]

21 1.51 Refractive Index Temperature [ C ]T C g= Refractive Index Refractive Index Extiction coefficient Extinction Coefficient Wavelength [nm]

24 P o lym er transp o rt layer 50nm Light Emitting Polymer-50nm IT O 200nm barrier layer substrate Lig ht ou tp u t

27 pinhole debris dim ple Light scattering from surface defect nodule Pinhole Substrate Substrate Substrate Bum p from protruding filler particle Dent in surface Debris sitting on surface

28 (a) (b)

29 5.7nm non-treatment 5.4nm treatment 15nm non-treatment 14nm treatment

39 A

53 WVTR [g/m2/ day] Sputtering Cleaning +Sputtering Cleaning +Supttering+Ion assist Thickness[nm] WVTR [g/m 2 day] Thickness [nm]

55 Tansmittance [%] n= n= Wavelength [nm]

56 92 Transmittance [%] bare PES sputter cleaning +sputter cleaning+sputter+ion assist Wavelength [nm] Transmittance [%] bare PES 22nm 45.7nm 64.5nm 110nm 170nm 212nm Wavelength [nm]

63 12 10 WVTR [g/m 2 /day] Thickness [nm] Trancemittance [%] Bare PES 30 nm 50 nm 71 nm 95 nm Wavelength [nm]

65 coating H 2 O coating H 2 O WVTR WVTR SiOx[110nm] SiOxNy[50nm] SiOxNy[25nm] SiOx[55nm] SiOxNy[13nm] SiOx[23nm] SiOxNy[13nm] SiOxNy[50nm] SiOx[110nm] SiOxNy[25nm] SiOx[23nm] SiOxNy[13nm] SiOx[55nm] SiOx[23nm] PES PES PES PES

66 1 = 1 P = = 1 P = = 1 P =0.92

72 [air/siox(88.40 nm)/sioxny(87.33 nm)/pes] [air/siox(100.6 nm)/sioxny(58.90 nm)/pes] Reflectance [%] Wavelength [nm] 11 Reflectance [%] 측정한반사율설계한반사율 Wavelength [nm]

융합WEEKTIP-2016-2-4data_up

융합WEEKTIP-2016-2-4data_up 2016 FEBRUARY vol.08 08 융합 OLED 봉지기술 (Encapuslation ) 의 현황과 전망 김의권 융합연구정책센터 발행일 2016. 02. 29 발행처 융합정책연구센터 융합 2016 FEBRUARY vol.08 OLED 봉지기술(Encapuslation )의 현황과 전망 김의권 융합연구정책센터 개요 봉지기술은 적용분야와 관계없이 OLED