코썸사이언스는 코썸사이언스는 Laser Application 분야및 Nano/MEMS Processing 분야의장비를공급하는기술혁신형기업입니다. 코썸사이언스는 1999 년창립이후 Hot Embossing System, EUV Lithography, Interferome

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회사소개서 < Company Profile > Kortherm Science Co., Ltd

코썸사이언스는 코썸사이언스는 Laser Application 분야및 Nano/MEMS Processing 분야의장비를공급하는기술혁신형기업입니다. 코썸사이언스는 1999 년창립이후 Hot Embossing System, EUV Lithography, Interferometer 등의장비를연구소, 학교, 대기업등에공급하여왔으며, 최근 Laser Micro machine 및 3D Profiler 를자체개발생산하고있습니다. 코썸사이언스는지금까지축적된경험과지식을바탕으로 Laser 응용분야의세계최고기술개발을목표로하고있습니다. 코썸사이언스는최고수준의제품과서비스를제공하기위해최선의노력을다하겠습니다

회사개요 대표이사 : 변주삼 임직원수 : 11 명 ( 비상근 2 명포함 ) 자본금 : 2 억 8 천만원 2008 년예상매출액 : 약 25 억 장비납품실적 : 150 건이상 주소 인천광역시부평구청천동 425 번지우림라이온스밸리 C 동 1203B 연락처 TEL : 032-623-6320~4, FAX : 032-623-6325 레이저응용기술연구소 ( 인하대 ) 홈페이지 www.ilat.co.kr

예상매출액 2008 년도 2009 년도 2010 년도 매출액 25 억원 70 억원 100 억원 매출액증가율 70% 64% 30%

회사연혁 1999 ( 주 ) 코썸사이언스창립 ( 부산시 ) 2000 Exitech Laser Micromachining System 소개 (Agent 계약 ) 2005 KOS Series system 개발경북대학교 KOS1000 설치 2007 기술혁신형중소기업인증 (INNO-BIZ) 레이저응용기술연구소설립 ( 인하대內 ) 벤처기업인증중소기업기술혁신개발사업주관기업선정 (2007:3.5 억 ) 2008 LG 전자납품 Solar cell isolation system 중소기업기술혁신로드맵과제주관기업선정 (2008:4.3 억 )

회사조직 레이저응용기술연구소 Institute of Laser Application Technologies CEO 경영지원부 Administrative Service Department 기술영업부 Engineering Sales Department 총무인사팀 General Affairs Team 구매관리팀 Purchasing Management Team 기술영업 1 팀 Engineering Sales Team 1 기술영업 2 팀 Engineering Sales Team 2 기술개발부 Technology Development Department 레이저응용기술연구팀 Laser Application Technology Development Team 광기술연구팀 Optic Technology Development Team 이사회 Board of directors 소프트웨어개발팀 Software Development Team

연구개발인력 R&D 인력 : 7 명 ( 외부기술고문 2 명포함 ) 박사 3 명 석사 3 명 학사 1 명 개발팀장 : 김동수박사 ( 고려대학교대학원 물리학전공 /LG전자) Mechanical Engineer - 윤홍식 ( 국민대대학원 기계공학전공 ) Optic Engineer - 홍성태 ( 한양대대학원 전기전자공학전공 ) Software Engineer - 강동오 ( 국민대대학원 기계공학전공 ) Technical support - 진병문교수 ( 동의대 ), 문병기교수 ( 부경대 ) 레이저응용기술연구소 (Institute of Laser Application Technologies) http://www.ilat.co.kr

납품실적 Laser Processing System ELA (Excimer Laser Annealing) 시스템 - 경북대학교 Laser annealing system - 부산대학교 Wafer cutting system - 동아대학교 Solar Cell R&D 장비 - LG 전자기술원 UV Laser System - 동아대학교 Laser Measurement System Surface profiler KPE ( 한국생산성연구원 ) 장력측정시스템 - 부경대학교 PIV (Particle Image Velocimetry) 시스템 - 동아대학교

취급제품소개 Manufacturing Items: 개발 & 생산 Laser Micromachining System (KOS system) 3D Profiler system Interferometer LIBS (Laser-Induced Breakdown Spectroscope) Diode Laser Controller (Current &Temperature) High Power Laser (Nd-YAG with 532/1064 nm) Offer Business Items: 수입 Hot Embossing System (Jenoptik Germany) EUV Lithography System (AixUV Germany) 3D Profiler System (NanoFocus Germany) Laser Doppler Vibrometer System (Sunwave Taiwan) Spatial Light Modulator (HoloEye Germany)

주요제품 (I) Manufacturing Items Kortherm Products & Solutions Laser Micromachining System (KOS system) - Solar cell scribing system - Laser dicing system - ITO Patterning system for FPD - Water jet guided Laser machining system - Customized system (R&D system, ELA, Hole drilling, thin film patterning, etc ) High Power Laser (Nd-YAG) - 1064nm - 532nm Average power: < 30 W Repetition rate: < 100 khz Pulse width: < 30 ns Average power: < 15 W Repetition rate: < 150kHz Pulse width: < 20ns

주요제품 (I) Manufacturing Items Kortherm Products & Solutions 3D Profiler system (KOS-P) - System - Sensor Unit (Module) Interferometer LIBS (Laser-Induced Breakdown Spectroscope) Diode Laser Controller (Current &Temperature) - CW - Pulse - UV/VIS/IR

Laser Micromachining System KOS 시스템개요 Sealed optics boxes Lasers and optics mounted to Granite for robust reliable operation Vibration isolation Up to 300 x 300mm travel X-Y stages Motorized stages (3-Axis) Vision system (pattern recognition, monitoring)

Laser Micromachining for Large Area 대면적 Micromachining System ( 주 1) Overview DISPLAYS Patterning thin films for FPDs Annealing TFTs for AMLCD FPDs Mastering of micro-lens arrays SOLAR POWER Solar cells Solar panels Type DPSS laser Wavelength 532-1064nm Pulse duration <50ns Power >20W Repetition rate 10.. 200 khz ( 주 1) 본연구는 2007~2008 년중소기업기술혁신개발사업의일환으로개발진행중입니다.

3D Profiler System : KOS-P KOS-P 시스템개요 Laser Source: 650nm Diode laser Measuring range: ±1mm Resolution: 0.01um Linearity: ±0.03% of FS

LIBS, LD Controller LIBS 시스템 Specifications Laser: Nd:YAG, 1064 nm, 10 ns pulse width, 100 or 200 mj/pulse Optical: Czerny-Turner spectroscope Detector CCD or Photodiode Array Wavelength range: 200-950 nm (up to 1200 nm available) Spectral resolution: 0.1 nm @ 300 nm A/D Conversion time: 1 M samples per second LD Controller Specifications Drives up to 1 watt laser diode in CW mode Monitors & controls diode temperature Monitors diode current with series resistor Controls diode current Monitors & controls thru built-in photodetector

주요상품 (II) Offer Business Items Offer Business Items Hot Embossing System (Jenoptik Germany) EUV Lithography System (AixUV Germany) 3D Profiler System (NanoFocus Germany) Laser Doppler Vibrometer System (Sunwave Taiwan) Spatial Light Modulator (HoloEye Germany)

Jenoptik - Hot Embossing System Hot embossing system 주요 Spec (HEX 04) Higher throughput and also fully automatable for full scale production runs at larger institutes & manufacturing companies Pressing force increment :10N, 20N, 30N Maximum pressing force : 400kN Cycle time : 3 minutes Temperature stability : ± 1 o C Maximum substrate diameter : 300mm Overlay accuracy : ± 2um

AIXUV - EUV Lithography Parameters of AIXUV s EUV-Lamp - EUV-Yield (total) : >50mJ /pulse - EUV-Yield inband : >5mJ / pulse - Input per pulse : 2J - Input power : 200W - Repetition rate : 100Hz - Guaranteed lifetime of electrode : >250,000,000 pulse - Certificates : CE, VDE - Interface : CF-flange

NanoFocus 3D Profiler Confocal microscope µsurf area technique Nanometer resolution for MEMS, 3D surface analysis Vertical resolution: 1nm Lateral Resolution: 300nm Scanning profilometer µscan moving x/y-stages different z-probes (autofocus, confocal, chromatic) for profile, flatness co-planarity vertical resolution: 20nm Lateral Resolution: 1um

Sunwave - Interferometer Laser Source: He-Ne Laser Spot diameter: 50X: 5um Band width: 20MHz for Doppler signal Displacement error: 0.4% of F.S Max. Velocity detectable: DPU (Digital processing unit) 6.3m/s Displacement detectable: 0.1 nm ~ 0.5 mm

HoloEye Spatial Light Modulator Projection 응용 - Printer applications (Imaging, 3D) - Optical Metrology and Fringe Projection - Special projection applications - HUDs and HMDs in airborne and defense industries - HUDs for automotive applications - SLMs for R&D - High resolution NTE applications (viewer) Phase Modulation 응용 - Telecommunication 및 Holographic security systems - Rapid DOE prototyping 및 Dynamic calibration - Bio-Photonics applications - Wave front generation - Digital Holography, dynamic diffractive optics

주요 Customer 기업 삼성전자, 삼성전기, 삼성 SDI LG 전자, LG 화학 국가연구센터 KIST,KAIST ETRI, KETI, KRISS, KIMM 나노종합팹센터 ( 경기 / 대전 / 포항 / 광주 ) 생산기술연구원 광주과학기술원 대학기관 서울대, 연세대, 고려대, 포항공대경북대, 부산대, 한양대, 동아대, 조선대등