회사소개서 < Company Profile > Kortherm Science Co., Ltd
코썸사이언스는 코썸사이언스는 Laser Application 분야및 Nano/MEMS Processing 분야의장비를공급하는기술혁신형기업입니다. 코썸사이언스는 1999 년창립이후 Hot Embossing System, EUV Lithography, Interferometer 등의장비를연구소, 학교, 대기업등에공급하여왔으며, 최근 Laser Micro machine 및 3D Profiler 를자체개발생산하고있습니다. 코썸사이언스는지금까지축적된경험과지식을바탕으로 Laser 응용분야의세계최고기술개발을목표로하고있습니다. 코썸사이언스는최고수준의제품과서비스를제공하기위해최선의노력을다하겠습니다
회사개요 대표이사 : 변주삼 임직원수 : 12 명 자본금 : 2 억 2007년예상매출액 : 약 30 억 장비납품실적 : 150건이상 주소인천광역시부평구청천동 425번지우림라이온스밸리 C동 1203B 연락처 TEL : 032-623-6320, FAX : 032-623-6325 홈페이지
회사연혁 1999 ( 주 ) 코썸사이언스창립 1999 Neoark Laser Micromachining system 소개 (Agent 계약 ) 2000 Exitech Laser Micromachining system 소개 (Agent 계약 ) 2003 KIST M2000 시스템설치 2005 NNFC M2000 시스템설치 2005 KOS Series system 개발 2005 경북대학교 KOS1000 설치 2006 부산대학교 KOS1000 설치 2007 동아대학교, KPE, 삼성등과공정장비개발협의중 기술혁신형중소기업인증 (INNO-BIZ) 연구전담부서설립, 벤처기업인증 중소기업기술혁신개발사업주관기업선정
회사조직 경영지원부 Administrative Service Department 총무인사팀 General Affairs Team 구매관리팀 Purchasing Management Team CEO 기술영업부 Engineering Sales Department 기술영업 1 팀 Engineering Sales Team 1 기술영업 2 팀 Engineering Sales Team 2 기술개발부 Technology Development Department 레이저응용기술연구팀 Laser Application Technology Development Team 광기술연구팀 Optic Technology Development Team 이사회 Board of directors 소프트웨어개발팀 Software Development Team
연구개발인력 R&D 인력 : 8 명 박사 3 명 석사 4 명 학사 1 명 개발팀장 : 서종식 ( 포항공대대학원 물리학전공 ) Mechanical Engineer : 윤홍식 ( 국민대대학원 기계공학전공 ) Process Engineer : 김정한 ( 연세대대학원 재료공학전공 ) Software Engineer : 강동오 ( 국민대대학원 기계공학전공 ) Optic Engineer : 김재진 ( 청주대학교 레이저광공학전공 ) Technical support : 진병문교수 ( 동의대 ), 문병기교수 ( 부경대 ) 김철한박사 ( 부산대 )
납품실적 Laser Processing System ELA (Excimer Laser Annealing) 시스템개발 ( 경북대 ) Laser annealing system 개발 ( 부산대 ) Oxidation catalysis system 개발 ( 화학연구원 ) Wafer cutting system 개발 ( 삼성전자 ) Solar cell Laser fired contact system 개발중 (KPE) Solar Cell 양산장비개발중 ( 에너지기술연구원, etc) Laser Measurement System Surface profiler 개발 (KPE) 장력측정시스템개발 ( 부경대 ) PIV (Particle Image Velocimetry) 시스템개발중 ( 동아대 ) Laser Interferometer 시스템개발중 (KAIST, KRISS)
제품소개 Manufacturing Item Laser Micromachining System (KOS system) 3D Profiler system LIBS (Laser-Induced Breakdown Spectroscope) LD Controller PLD (Pulsed Laser Deposition) Offer Business Items Hot Embossing System (Jenoptik Germany) EUV Lithography System (AixUV Germany) 3D Profiler System (NanoFocus Germany) Laser Doppler Vibrometer System (Sunwave Taiwan) Spatial Light Modulator (HoloEye Germany)
주요제품 (I) Manufacturing Items Kortherm Products & Solutions Laser Micromachining System (KOS system) 3D Profiler system (KOS-P) LIBS (Laser-Induced Breakdown Spectroscope) LD Controller PLD (Pulsed Laser Deposition)
Laser Micromachining System KOS 시스템개요 Sealed optics boxes Lasers and optics mounted to Granite for robust reliable operation Vibration isolation Up to 300 x 300mm travel X-Y stages Motorized stages (3-Axis) Vision system (pattern recognition, monitoring)
Applications of Laser Micromachining System KOS 시스템응용사례 Nozzle drilling Inkjet printers PCB via hole Wafer cutting & scribing Marking Thin firm scribing for FPD Solar cell scribing Excimer Laser Annealing
Laser Micromachining for Large Area 대면적 Micromachining System ( 주 1) Overview DISPLAYS Patterning thin films for FPDs Annealing TFTs for AMLCD FPDs Mastering of micro-lens arrays SOLAR POWER Solar cells Solar panels Type DPSS laser Wavelength 532-1064nm Pulse duration <50ns Power >20W Repetition rate 10.. 200 khz ( 주 1) 본연구는 2007~2008 년중소기업기술혁신개발사업의일환으로개발진행중입니다.
Applications of Micromachining for Large Area 대면적 Laser 미세가공응용사례 Solar cell scribing FPD Patterning (LCD & PDP) 50 µm scribe in Mo 50 µm scribe in ZnO Black matrix patterning Min. width = 5μm ITO patterning on Glass width = 80μm ITO patterning on Glass width = 200μm
3D Profiler System : KOS-P KOS-P 시스템개요 Laser Source: 650nm Diode laser Measuring range: ±1mm Resolution: 0.01um Linearity: ±0.03% of FS
LIBS, LD Controller LIBS 시스템 Specifications Laser: Nd:YAG, 1064 nm, 10 ns pulse width, 100 or 200 mj/pulse Optical: Czerny-Turner spectroscope Detector CCD or Photodiode Array Wavelength range: 200-950 nm (up to 1200 nm available) Spectral resolution: 0.1 nm @ 300 nm A/D Conversion time: 1 M samples per second LD Controller Specifications Drives up to 1 watt laser diode in CW mode Monitors & controls diode temperature Monitors diode current with series resistor Controls diode current Monitors & controls thru built-in photodetector
주요제품 (II) Offer Business Items Offer Business Items Hot Embossing System (Jenoptik Germany) EUV Lithography System (AixUV Germany) 3D Profiler System (NanoFocus Germany) Laser Doppler Vibrometer System (Sunwave Taiwan) Spatial Light Modulator (HoloEye Germany)
Jenoptik - Hot Embossing System Hot embossing system 주요 Spec (HEX 04) Higher throughput and also fully automatable for full scale production runs at larger institutes & manufacturing companies Pressing force increment :10N, 20N, 30N Maximum pressing force : 400kN Cycle time : 3 minutes Temperature stability : ± 1 o C Maximum substrate diameter : 300mm Overlay accuracy : ± 2um
Applications of Hot Embossing System Micro-optic Micro-fluidic Micro-mechanic JENOPTIK PC MT Fuji JENOPTIK PC MT L.O.S fiber Bosch LSU Cannon Blusi LTU
AIXUV - EUV Lithography Parameters of AIXUV s EUV-Lamp - EUV-Yield (total) : >50mJ /pulse - EUV-Yield inband : >5mJ / pulse - Input per pulse : 2J - Input power : 200W - Repetition rate : 100Hz - Guaranteed lifetime of electrode : >250,000,000 pulse - Certificates : CE, VDE - Interface : CF-flange
NanoFocus 3D Profiler Confocal microscope µsurf area technique Nanometer resolution for MEMS, 3D surface analysis Vertical resolution: 1nm Lateral Resolution: 300nm Scanning profilometer µscan moving x/y-stages different z-probes (autofocus, confocal, chromatic) for profile, flatness co-planarity vertical resolution: 20nm Lateral Resolution: 1um
Sunwave - Interferometer Laser Source: He-Ne Laser Spot diameter: 50X: 5um Band width: 20MHz for Doppler signal Displacement error: 0.4% of F.S Max. Velocity detectable: DPU (Digital processing unit) 6.3m/s Displacement detectable: 0.1 nm ~ 0.5 mm
HoloEye Spatial Light Modulator Projection 응용 - Printer applications (Imaging, 3D) - Optical Metrology and Fringe Projection - Special projection applications - HUDs and HMDs in airborne and defense industries - HUDs for automotive applications - SLMs for R&D - High resolution NTE applications (viewer) Phase Modulation 응용 - Telecommunication 및 Holographic security systems - Rapid DOE prototyping 및 Dynamic calibration - Bio-Photonics applications - Wave front generation - Digital Holography, dynamic diffractive optics
주요 Customer 기업 삼성전자, 삼성전기, 삼성 SDI LG 전자, LG 화학 국가연구센터 KIST,KAIST ETRI, KETI, KRISS, KIMM 나노종합팹센터 ( 경기 / 대전 / 포항 / 광주 ) 고등기술연구원 생산기술연구원 광주과학기술원 대학기관 서울대, 부산대, 경북대, 포항공대, 한양대, 연세대