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1 Jurnal f the Krean Ceramic Sciety Vl. 44, N. 3, pp. 16~168, 007. Fabricatin and Netwrk Strengthening f Mnlithic Silica Aergels Using Water Glass In-Sub Han, Jng-Chul Park, Se-Yung Kim, Ki-Seg Hng, and Hae Jin Hwang* Energy Materials Research Center, Krea Institute f Energy Research, Daejn , Krea *Department f Materials Science and Engineering, Inha University, Inchen , Krea (Received December 14, 006; Accepted January 17, 007) w e y w Á Á½ Áy» Áyw * l w» * w w œw ( ; ) ABSTRACT Silica wet gels were prepared frm water glass (9 wt% SiO ) by using Amberlite as a in exchange resin. After washing in distilled water, the wet gels were further aged in a slutin f TEOS/EtOH t strengthen f 3-dimensinal netwrk structure. As increase TEOS cntent in aging slutin, BET surface area and prsity f the ambient dried silica aergels were significantly decreased, and average pre diameter was als decreased 30 nm t 10 nm. Als, higher density and cmpressive strength were btained in case f higher TEOS cntent. This is due t precipitatin f SiO nan particles by TEOS. Hence, TEOS additin plays an imprtant rle f bth strengthening and stiffness f silica wet gel netwrk. By adding ver 30 vl% TEOS, a crack-free mnlithic silica aergel tiles were btained and its density, cmpressive strength, and thermal cnductivity were shwn 0.3 g/cm 3, 7.3 MPa, and 0.09 W/mK, respectively. Key wrds : Aergel, Water glass, Wet gel, Netwrk strengthening, Surface mdificatin 1. Crrespnding authr : In Sub Han ishan@kier.re.kr Tel : Fax : »œ (prsity ~99%) û (refractive index 1.01~1.1) n (transparency >90%), t (specific surface area >1000 m /g) û (thermal cnductivity ~0.0 W/mK). 1-5) p, e p,», Ÿw p w y, š y w sƒ, q, š z d. 6-11) ù e w p wš j» k xk w ù ƒ w t ƒ w w. - w g TEOS(tetraethxysilane)ù TMOS(tetramethxysilane)ƒ šƒ š, (wet gel) w š š mj eƒ. w w w w» w šƒ ƒ œ (water glass) w w w ù, ƒ mw e w š ) ù w TEOSƒ w wš y mw w e w w šƒ w š w œ e w ù, šw w ƒ. w ƒ m w ³ j» e w ¾ œ. w wš, TEOS w y œ e z t mw ³ w e k wš w, e k 16

2 w e y 163 Fig. 1. Schematic diagram f the mnlithic silica aergel tile fabricatin. t»œ s, mw y w.. x.1. k xœ Fig. 1. ³ (sdium silicate, 9 wt% SiO, Ilshin Chemical, Krea), (water glass) 8wt% w y (Amberlite IR10-H, Rhm & Hass, China) 80 mm, 40 cm j» q f 30 ml/min m g e., e w d w, 5.7 wt% ùkû. ph.0~.5 e w 1M NH 4 OH(Duksan Pure Chem, Krea) ƒw ph 4.5¾. z, e 10 cm j» s p» 50 g z, ü sw»s ƒ w 50 C» 1 y w g. w (wet gel)»,» ü w t» ü 50 C 1~4 jš,» ü k w 1~4 ww. wr y k w TEOS (tetraethxysilane, 98%, Samchun Chemical, Krea) ƒƒ 0~40 vl% w 4 j w. z, Ra 18) w w t ü w n- heptane(99%, Junsei, Japan) 50 C 4 w. t ey n-hexane(95%, Samchun, Krea) TMCS(tri-methylchlrsilane, 95%, Acrs Organic, Krea) v 10:1 yww y z jš, ~5 /ey ww. t n-heptane w z n-heptane b.p. 98 C g k w... p sƒ e N d (Micrmeritics, ASAP 400, U.S.A.)w BET t d w š BJH»œ s d w. x x (FE-SEM, Hitachi S-4700, Japan) n x (TEM, Carl Zeiss, Le-EM91 Omega, U.S.A.) w. v d w w,»œ w w.» ρ m v v/ d w š, ρ as e (. g/cm 3 ). Prsity 1 ρ m ρ as 100 = ³ e mm j» ƒœw x»(tinius Olsen, QMAT, U.K.) w 0.1 mm/min crss head speed, 50 N lad cell d w. wr v (Netzsch LFA-447, Germany) 1 mm, Ì 1mm r ƒœw d w. 3. š 3.1. y z y mw e ƒ phƒ ƒ y ƒ. Fig. e ph 4.5 ƒ jš 50 C» 1 w z, 4 e. v e ¼» j» 100 mm, Ì 7mm j» 91 mm, Ì 6mm 71% xkƒ. Fig. 3»w w k e z, k ü TEOS ƒ y g y k. TEOS w 0 vl% 40 vl% y g, TEOS 44«3y(007)

3 한인섭 박종철 김세영 홍기석 황해진 164 Fig.. Phtgraphs f silica wet gel prepared by water glass. Fig. 4. Phtgraphs f netwrk strengthened silica wet gels after slvent exchange and surface mdificatin; (a) 0 vl%, (b) 10 vl%, (c) 0 vl%, (d) 30 vl%, and (e) 40 vl% TEOS. Fig. 3. Phtgraphs f silica wet gels netwrk strengthened in TEOS/EtOH slutin at 50 C fr 48 h; (a) 0 vl%, (b) 10 vl%, (c) 0 vl%, (d) 30 vl%, and (e) 40 vl% TEOS. 함량이 높을수록 습윤젤의 불투명도는 증가하였으며, 이 는 습윤젤의 내부 망목구조에 TEOS에서 석출되는 SiO 의 양이 증가함에 기인하는 것으로 사료된다. 습윤젤 용매치환 및 표면개질 효과 TEOS 첨가량에 따라 구조강화된 습윤젤을 용매치환 과 정과 표면개질 공정을 거쳐 n-heptane으로 세척한 습윤젤 의 상태를 Fig. 4에 나타내었다. 여기에서 TEOS를 첨가 하지 않은 (a)의 경우, TMCS/n-hexane에 의한 용매치환 및 표면개질 단계에서 균열이 발생하여 초기의 형태를 유 지하지 못하고 있음을 알 수 있다. 이에 비해 소량의 TEOS 첨가에 의해 구조강화 공정을 거친 (b)~(e)의 경우 에는 습윤젤의 초기 형상을 그대로 유지하고 있어 TEOS 첨가에 의해 석출되는 SiO 가 습윤젤의 망목구조 강화에 확실하게 기여하고 있음을 알 수 있다. Fig. 5는 표면개질 후, 98 C로 유지된 건조기에서 n-heptane 용매를 완전하게 증발시켜 습윤젤에서 에어로젤로 상압 3.. 한국세라믹학회지 Fig. 5. Phtgraphs f mnlithic silica aergels ambient dried at 98 C fr 4 h; (a) 0 vl%, (b) 10 vl%, (c) 0 vl%, (d) 30 vl%, and (e) 40 vl% TEOS. 건조된 상태의 사진이다. TEOS 함량이 10 vl%인 용매에 서 구조강화 시킨 (b)의 경우, 앞서 용매치환 및 표면개 질 공정에서 균열이 발생한 (a)의 경우와 마찬가지로 작은 조각으로 균열이 진행되어 초기 습윤젤 형태를 유지하지 못하고 있음을 알 수 있다. 또한 TEOS 함량이 0 vl%인 (c)의 경우에도 형태는 유지하고 있으나, 큰 균열이 발생 하여 ~3 조각 정도로 갈라져 완전한 타일 형태를 유지 하지 못함을 알 수 있다. 이와는 달리 TEOS의 함량이 각 각 30 vl%와 40 vl%인 (d)와 (e)의 경우에는 초기 습윤 젤의 모양을 그대로 유지하면서 균열이 존재하지 않는 실 리카 에어로젤 모노리스 타일 상태로 상압건조 되었음을 알 수 있다. 이러한 현상은 용매치환 후, 표면개질이 완료된 습윤젤 은 건조 시, 치환용매의 낮은 표면장력에 의한 모세관력 으로 인해 수축이 되기는 하지만, 이러한 수축은 가역적

4 물유리를 이용한 모노리스 실리카 에어로젤의 제조 및 구조강화 Fig. 6. Schematic diagram f crack initiatin and prpagatin f wet gels by springback phenmenn during ambient drying. 인 수축이므로 열처리 과정이 진행됨에 따라 용매로 인 한 모세관력이 완화됨과 동시에 기공 내부 기체의 열적 팽창으로 인해 그 망목구조가 재팽창하게 되는 스프링백 (springback) 현상이 주 원인이라고 판단된다. 즉, Fig. 6에 나타낸 바와 같이 표면개질이 완료된 습윤젤은 상압건조 과정에서 용매가 완전히 증발하게 되는데, 용매가 점차적 으로 증발하게 됨에 따라 (b)에서 보는 바와 같이 습윤젤 의 바닥면은 인장응력, 상부표면은 압축응력이 걸리는 상 태로 수축이 진행되면서 용매의증발이 진행되며, 용매가 165 완전히 증발한 후 스프링백 현상에 의해 (c)에 나타낸 바 와 같이 초기의 습윤젤 크기로 회복되는 과정에서 상부 표면에서 인장응력에 의한 균열이 생성되기 시작하여 이 들 균열이 내부로 전파되기 때문인 것으로 사료된다. 따라서 Fig. 5의 결과에서도 구조강화를 위해 첨가한 TEOS의 함량이 적을수록 더 많은 균열이 발생하면서 습 윤젤이 갈라지고 있음을 확인할 수 있으며, 균열이 발생 하지 않는 실리카 에어로젤 모노리스의 상압건조는 30 vl% 와 40 vl% TEOS 첨가에 의한 구조강화 조건에서 나타 나고 있음을 알 수 있었다. Fig. 7은 상압건조된 실리카 에어로젤의 미세구조를 주 사전자현미경(FE-SEM)으로 관찰한 사진이다. TEOS 함량 별 각각의 모노리스 타일의 내부를 구성하고 있는 실리 카 입자의 크기는 50 nm 이하였으며, TEOS에 의한 구조 강화를 하지 않은 실리카 에어로젤과 최대 40 vl%의 함 량을 갖는 경우의 차이가 확연히 구분되고 있음을 알 수 있다. 또한 Fig. 8의 투과전자현미경(TEM)을 통해 관찰한 미세구조 결과에서도 확인할 수 있는 바와 같이 TEOS로 구조강화를 하지 않은 (a)의 경우에 비해 TEOS의 함량이 30 vl% 첨가되어 구조강화시킨 (b)의 경우가 망목구조를 형성하고 있는 실리카 입자의 크기가 증가하고 있을 뿐 만 아니라 상대적으로 치밀한 조직을 나타내고 있음을 알 수 있다. 따라서 TEOS의 첨가에 의해 실리카졸의 젤화 과정에 서 형성된 1차 실리카(SiO ) 입자 망목구조 사이에 나노 실리카 입자의 석출에 의한 차 망목구조가 형성됨에 따 라 구조강화가 진행되고 있음을 확인할 수 있으며, 30 vl% Fig. 7. SEM images f ambient dried silica aergel with varius TEOS cntent; (a) 0 vl%, (b) 10 vl%, (c) 0 vl%, (d) 30 vl%, and (e) 40 vl% TEOS. 제 44 권 제 3호(007)

5 한인섭 박종철 김세영 홍기석 황해진 166 Fig. 10. Pre size distributin f mnlithic silica aergels with varius TEOS cntent. Fig. 8. TEM images f ambient dried silica aergel with TEOS cntent; (a) withut TEOS and (b) 30 vl% TEOS. Fig. 11. Density and prsity f mnlithic silica aergels with varius TEOS cntent. Fig. 9. BET surface area f mnlithic silica aergels with varius TEOS cntent. TEOS 이상이 첨가된 조성에서 조합에서 구조강화에 의 한 crack-free 상태의 모노리스 실리카 에어로젤 제조조건 을 확립할 수 있었다. Fig. 9는 TEOS 함량에 따른 각각의 실리카 에어로젤에 대한 N 흡탈착 특성 측정을 통해 BET 표면적을 분석한 결과이다. TEOS의 함량이 높아질수록 비표면적이 감소하 고 있는 결과로 보아 습윤젤 망목구조 내부에 TEOS에 의 해 석출되는 SiO 미세입자가 증가되고, 이로 인해 나노 기공이 채워짐에 따라 비표면적이 낮아진다는 것을 확인 할 수 있었다. 이는 Fig. 4의 표면개질 공정을 거친 후 습 한국세라믹학회지 윤젤의 사진에서 불투명도가 증가하는 경향을 보인 것과 도 연관되는 결과이다. 또한 Fig. 10에 나타낸 기공크기 분포 결과를 보면 TEOS 처리가 진행됨에 따라 평균 기공크기가 구조강화 처리를 하지 않았을 때 30 nm 크기에서 최대 40 vl% TEOS로 구조강화시킨 경우, 10 nm 크기 이하로 점차 감소하는 경 향을 나타내어 상기한 결과를 잘 뒷받침 하고 있다. 한편 밀도와 기공율 측정 결과, Fig. 11에서 보는 바와 같이 밀도의 경우, 구조강화에 관여한 TEOS의 첨가량에 비례하여 그 값이 증가하였고, 기공율은 감소하고 있음을 알 수 있어 TEOS 첨가량 증가에 따른 망목구조 내에서의 강화효과가 확실히 나타나고 있음을 알 수 있다. 또한 crackfree하게 상압건조가 진행된 30 vl%와 40 vl% TEOS를 함 유한 에어로젤의 압축강도를 측정한 결과, Table 1에 나 타낸 바와 같이 TEOS의 함량이 많은 에어로젤이 상대적 으로 높은 강도 특성을 나타내고 있어 TEOS의 첨가가 모 노리스 실리카 에어로젤의 기계적 특성 향상에 크게 기

6 w e y 167 Table 1. Cmpressive Strength f Ambient Dried Mnlithic Silica Aergel with 30 vl% and 40 vl% TEOS Cmpsitins f netwrk strengthening slutin Cmpressive strength (MPa) 30 vl% TEOS+70 vl% EtOH vl% TEOS+60 vl% EtOH 10.6 Table. Thermal Cnductivity f Ambient Dried Mnlithic Silica Aergel with 30 vl% TEOS Sample Temperature ( C) Thermal diffusivity (mm /s) Specific heat (C p ) (J/gK) Density (g/cc) Thermal cnductivity (W/mK) 30 vl% TEOS wš. e» p ü w» w ù œw» w ƒ š w» w p w. Table 30 vl% TEOS w e 1 mm, Ì 1mm w w v w y d w w, 5z d w s³ ùkü. d 0.09 W/mK ƒ û e. w e k w» w ƒ w p w., d x ¾ š š ƒ TEOS w š, œ w e (0.016~0.0 W/mK) w w ù, TEOS w 30 vl% w ƒ crack-freew x œ y w,»œ ƒ w û e ƒ ƒ w. 4. w y m w w e š, w ph w z TEOS ƒ y ƒ y e k w p w,. 1. e ph 4.5 ƒ j š, 50 C 1 e.. y w TEOSƒ ƒ k 48 wš, TMCS/n-hexane ey t e, 0 vl% TEOSƒ ƒ»x w e. 3. TEOS w, crackfreew k 30 vl% TEOSƒ ƒ,» j» 10% ùküš. 4. BET, TEOS ƒ ƒw t, s³»œj»ƒ w w ùkû, w ƒwš»œ ww ù kü, w ü TEOS ƒ w SiO ƒ ƒw» w y w. 5. TEOS ƒ ƒw ƒw, p 30 vl% TEOSƒ ƒ e, d w, ƒ ƒ 7.3 MPa, 0.09 W/mK w», p e. Acknwledgments Á» x (004- E-FM11-P ) w w,. REFERENCES 1. J. Fricke, Aergels-Highly Tenuus Slids with Fascinating Prperties, J. Nn-Crystalline Slids, 100 [1-3] (1988).. P. Wang, W. Körner, A. Emmerling, A. Beck, J. Kuhn, and J. Fricke, Optical Investigatins f Silica Aergels, J. Nn-Crystalline Slids, (199). 3. L. Kcn, F. Despetis, and J. Palippu, Ultralw Density Silica Aergels by Alchl Supercritical Drying, J. Nn- Crystalline Slids, 5 [1] (1998). 4. A. C. Pierre and G. M. Pajnk, Chemistry f Aergels and Their Applicatins, Chem. Rev., 10 [11] (00). 44«3y(007)

7 168 w Á Á½ Áy» Áyw 5. C. A. Mrris, M. L. Andersn, R. M. Strud, C. I. Merzbacher, and D. R. Rlisn, Silica Sl as a Nanglue: Flexible Synthesis f Cmpsite Aergels, Science, (1999). 6. L. W. Hrubesh and J. F. Pc, Thin Aergel Films fr Optical, Thermal, Acustic and Electrnic Applicatins, J. Nn-Crystalline Slids, 188 [1-] (1995). 7. R. Gerlach, O. Kraus, J. Fricke, P.-C. Eccardt, N. Kremer, and V. Magri, Mdified SiO Aergels as Acustic Impedance Matching Layers in Ultrasnic Devices, J. Nn- Crystalline Slids, (199). 8. A. C. Pierre and G. M. Pajnk, Chemistry f Aergels and Their Applicatins, Chem. Rev., 10 [11] (00). 9. G. M. Pajnk, Aergel Catalysts, Applied Catalysis., 7 [] (1991). 10. D. Haranath, P. B. Wagh, G. M. Pajnk, and A. Venkateswara Ra, Influence f Sl-Gel Prcessing Parameters n the Ultrasnic Sund Velcities in Silica Aergels, Mater. Res. Bull., 3 [8] (1997). 11. J. Pint da Cunha, F. Neves, and M. I. Lpes, On the Recnstructin f Cherenkv Rings frm Aergel Radiatrs, Nucl. Instrum. Meth., A 45 [3] (000). 1. M. Schmidt and F. Schwertfeger, Applicatins fr Silica Aergel Prducts, J. Nn-Cryst. Slids, 5 [1] (1998). 13. G. S. Kim and S. H. Hyun, Synthesis f Windw Glazing Cated with Silica Aergel Films via Ambient Drying, J. Nn-Crystalline Slids, (003). 14. S. S. Prakash, C. J. Brinker, A. J. Hurd, and S. M. Ra, Silica Aergel Films Prepared at Ambient Pressure by Using Surface Derivatizatin t Induce Reversible Drying Shrinkage, Nature, (1995). 15. S. S. Prakash, C. J. Brinker, and A. J. Hurd, Silica Aergel Films at Ambient Pressure, J. Nn-Crystalline Slids, 190 [3] (1995). 16. H. S. Yang, S. Y. Chi, S. H. Hyun, H. H. Park, and J. K. Hng, Ambient-Dried Lw Dielectric SiO Aergel Thin Film, J. Nn-Crystalline Slids, 1 [-3] (1997). 17. A. Venkateswara Ra, A. Parvathy Ra, and M. M. Kulkarni, Influence f Gel Aging and Na SiO 3 /H O Mlar Rati n Mnlithicity and Physical Prperties f Water-Glass-Based Aergels Dried at Atmspheric Pressure, J. Nn-Crystalline Slids, (004). 18. A. Venkateswara Ra, E. Nilsen, and M. A. Einarsrud, Effect f Precursrs, Methylatin Agents and Slvents n the Physicchemical Prperties f Silica Aergels Prepared by Atmspheric Pressure Drying Methd, J. Nn-Crystalline Slids, 96 [3] (001). w wz

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