OLED (Organic Light Emitting Diodes) DS LINETECH Co., Ltd. 윤재영 (010-3736 - 3436) Mail to jy@dslinetech.com uncleyun@gmail.com
Contents 1. 취급품목 1. GENERAL 2. OLED 1. OLED 제조공정 2. OLED 측정항목 3. OLED 측정기기 1. Metrohm Applikon B.V 2. Metrohm Applikon 기기 3. Metrohm Applikon 비교 4. Applications 5. 사용자현황 4. OLED 측정기기 1. Rhosonics Analytical B.V 2. Rhosonics 기기 3. Applications 4. 초음파분석기장점 5. OLED 측정기기 1. OPTEK Danulat 2. OPTEK Controller 3. OPTEK Sensors 4. OPTEK Applications
취급품목 METROHM APPLIKON B.V. ( 네덜란드 ) - 온라인적정기 - 온라인중금속분석기 - 온라인이온선택전극법분석기 - 온라인발색법분석기 RHOSONICS ( 네덜란드 ) - 온라인초음파방식농도분석기 * Binary 분석기 ( 물 + 황산, 염산, NaOH, TMAH) * Ternary 분석기 (TMAH + PR, Cu + H2SO4, Fe + HCl) OPTEK ( 독일 ) - 온라인 UV 방식농도분석기 - 온라인탁도방식농도분석기 - 온라인색상방식농도분석기 - 온라인 ph / 전도도분석기
OLED 두개의전극사이에유기물을배열하고전계를가하여빛을내는디스플레이의한방식으로고효율, 고속응답, 저소비전력, 고화질, 광시야각등차세대 디스플레이로서필요한모든요소를가지고있음. OLED 패널부분과 Driving Circuit 부분
OLED 제조공정 Cr / ITO Glass ITO Glass Patterning Insulator Separator 1. Glass Substrate: 5. ITO Patterning : 6. Inter - Insulator Coating: 8. Separator Coating: 주요자재 = Glass, Etchant. PR, 세정기 Roll Coater Soft Bake 세정기 Slit Coater 세정기 Slit Coater 현상, 세정 노광기 현상기 Hard Bake 7. Inter - Insulator Patterning: 9. Separator Patterning: Metal Etch Soft Bake 노광기 현상기 주요자재 = 유기물 2. ITO Sputtering Box Oven 3. Cr Sputtering Soft Bake 노광기 P.E.B 4. Cr Patterning: 현상기 Box Oven 세정기 Roll Coater Soft Bake 노광기 현상기 Hard Bake Metal Etch Organic Layer( 진공 ) Metal Layer( 진공 ) Encapsulation Module 10. HIL Coating: Chamber 1 14. Li/Al Coating: Chamber 7,8 16. Encapsulation: 17. FPC Bonding: 11. HTL Coating: Chamber 2 15. Al Coating: Chamber 7,8 주요자재 = Metal CAP 주요자재 = TAB IC, ACF, POL, 12. EML Coating: 각종 Tape 류 G : Chamber 3 건습제, 흡습, Sheet, Sealant B : Chamber 4 R : Chamber 5 13. ETL Coating: Chamber 6
OLED 측정항목 1. Glass Substrate : 1) Glass Sliming : HF/HNO3/HAc, HF/HNO3/H2SO4 등의혼산측정 2) Etchant : 각산및염기의농도측정 3) 현상 / PR : TMAH + PR 의농도모니터링및관리 4) 세정 : KOH 및세정제의농도측정 4. Cr Patterning : 1) 현상 : TMAH 및현상액의농도측정 2) Metal Etching : 각산및염기의농도측정 5. ITO Patterning : 1) 세정 : KOH 및세정제의농도측정 2) 현상 : TMAH 및현상액의농도측정 3) Metal Etching : 각산및염기의농도측정 6. Inter - Insulator Coating : 1) 세정 : KOH 및세정제의농도측정 7. Inter - Insulator Patterning : 1) 현상 : TMAH 및현상액의농도측정 8. Separator Coating : 1) 세정 : KOH 및세정제의농도측정 7. Separator Patterning : 1) 현상 : TMAH 및현상액의농도측정
OLED 측정기기 - Metrohm Applikon B.V Located in Netherlands Founded at 1973 300 Employees On - Line Analysis System Metrohm Group
Metrohm Applikon Analyzer - 일반기기 ADI 2045-4 개라인 - 다항목분석 - Blend acid ADI 2016-1 개라인 - 단일항목분석 - TMAH. KOH ADI 2018-2 개라인 - 단일항목분석 - 이온선택전극법 ADI 2019-2 개라인 - 단일항목분석 - UV/VIS 법
Metrohm Applikon Analyzer - 비교 ADI 2045 ADI 2016 ADI 2018 ADI 2019 적정방법 Titration, ISE, Colorimetry Titration, 직접측정 ISE, 표준적가 Colorimetry 시료의수여러개시료 1 개또는 2 개 화면표시 15 Touch Screen Panel 2 lines 40-character alphanumeric illuminated LCD 기기구조 2 separate with 2 glass door 2 separate with one tempered glass door Internal Memory 1,000 300 Size(HxWxDmm) Weight 870x700x500 75 Kg 700 x 460 x 352 50 Kg
Metrohm Applikon Application Al Etchant ( HNO 3, H 3 PO 4, CH 3 COOH ) ITO Etchant (HNO 3 + HCl / HNO 3 + CH 3 COOH) Cr Etchant ( Ceric Ammonium Nitrate. CAN ) Water in IPA KOH & Carbonate ( Inorganic ) Hydrofluoric Acid (0.3-1-3-5%) Solutions Peroxide and Sulphuric Acid in Acid Etch NaOH in Developer Potassium Carbonate / Bicarbonate in Developer TMAH (Tetra-methyl Ammonium hydroxide) in Organic Developer HF in Ferric Chloride Etchant & Microetch Mixed Acid Etchants ( HCl + HF / HNO 3 + HF + HAc / HNO 3 + HF + H 2 SO 4 ) NaOH in Photo Resist Stripper HCl or H 3 PO 4 in Acid Sump KOH in Caustic Sump H 2 O 2 in Wafer Clean Process NH 4 OH in Wafer Clean Process Silica in Rinsing water Hydrochloric Acid in Microetch Nickel, Boric Acid and Chloride in Nickel Sulfamate Plate Ammonium Hydroxide & Hydrogen Peroxide in SC1 Hydrogen Peroxide & Hydrochloric Acid in SC2 Hydrochloric Acid or Phosphoric Acid in Clean Bath Alkalinity, NaPs, H 2 SO 4, Pd, ph Cu / NaOH / HCHO, KMnO 4, Cleaner / H 2 SO 4 H 2 SO 4, Cu / H 2 SO 4 / Cl, Brightner / Leveller H 2 O 2, Reducer, NaOH / Cu, Cl Cu / Oxone / 환원제, Pd
Metrohm Applikon 기기사용처 - 국내 No. 회사 지역 모델 분석항목 분야 공정 1 삼성테크윈 창원 2040 Ni / Phosphate PCB Plating 2 삼성테크윈 창원 2040 NaOH / HCHO PCB Plating 3 SMC 인천 2016 Cu / H2SO4 PCB Plating 4 LG INNOTEK 구미 2016 HNO3 PCB Plating 5 LG INNOTEK 구미 2016 HNO3 PCB Plating 6 LG INNOTEK 구미 2040 Cu / Sn / Acid PCB Plating 7 LG INNOTEK 구미 2016 KOH PCB Plating 8 LG INNOTEK 구미 2016 Na2CO3 PCB Plating 9 스템코 오창 20145 Cu / Sn / Acid PCB Plating 10 Hydis 이천 2040 Blended Acid LCD Al Etchant 11 삼성전자 기흥 2040 Blended Acid LCD Al Etchant 12 삼성전자 기흥 2040 Blended Acid LCD Al Etchant 13 삼성전자 기흥 2040 CAN LCD Cr Etchant 14 삼성전자 기흥 2040 CAN LCD Cr Etchant 15 삼성전자 기흥 2040 Amine LCD Stripper 16 삼성전자 기흥 2040 Amine LCD Stripper
Metrohm Applikon 기기사용처 - 국내 No. 회사 지역 모델 분석항목 분야 공정 17 BOE Hydis 중국 2016 TMAH LCD Developer 18 SI Flex 인천 2016 Cu / H2SO4 PCB Plating 19 삼성전기 세종 2045 Cu / H2SO4 / Cl / CVS PCB Plating 20 삼성전기 부산 2045 Cu / H2SO4 / Cl / CVS PCB Plating 21 AOU 대만 2040 Blended Acid LCD Al Etchant 22 LGD 파주 2016 TMAH LCD Developer 23 삼성전기 세종 2045 HCHO / NaOH / DMAB PCB Plating 24 FIS 안성 2045 HF / HNO3 / H2SO4 LCD Mixing 25 매그나칩 청주 2040 H2O2 Wafer Cleaning 26 SK Hynix 청주 2045 HF / H2O2 / H2SO4 Wafer Cleaning 27 실트론 구미 2045 Metal Wafer SC1 28 실트론 구미 2045 Metal Wafer SC1 29 실트론 구미 2016 KOH Wafer SC1 30 실트론 구미 2016 KOH Wafer SC1 31 두손산업 화성 2016 Na2CO3 PCB PCB 32 동부하이텍 음성 2040 TMAH (Dual) Wafer Developer 33 삼성전기 수원 2045 Cu / H2SO4 / Cl / CVS PCB Plating
OLED 측정기기 - RHOSONICS ANALYTICAL BV HQ in Putten the Netherlands Founded at 1991 Around 10 Employees 16 Distributors ( 15 Countries ) NDT & OEM Products
RHOSONICS 기기 - Model 8500 / 9570 Analyzer 적용방법 : 초음파및온도 측정범위 : 자동조절 내장보정 : 기본 1 개 ( 최대 20 개 ) 정확도 : Better than +/- 0.05 % (+/- 0.005 %) 센서재질 : SUS 316 L (ETFE Coating) 응용분야 : 반도체 / 전기전자 / 솔라셀 / 화학 / 석유화학등 적용약품 : TMAH, KOH, NH 4 OH, H 2 SO 4, NaOH, HCl, HNO 3, KCl, NaCl, HF, Oil in water, Water in oil, Glycol in water, Water in glycol, Solvents 적용방법 : 초음파, 전도도및온도 측정범위 : 자동조절 내장보정 : 기본 1개 ( 최대 20 개 ) 정확도 : Better than 0.05 % 0 ~ 1 wt % : 0.005 wt % 이상 0 ~ 10 wt % : 0.01 wt % 이상 센서재질 : SUS 316 L (ETFE Coating), CPVC, ETFE 응용분야 : 반도체 / 전기전자 / 솔라셀 / 철강 / 금속 / 화학 / 석유화학등 적용약품 : TMAH & PR, 전해질용액, Pickling Bath, Etching, Solvent 농도 CuSO 4 (Cu 2+ ) & H 2 SO 4, FeCl 2 (Fe 2+ ) & HCl, ZnSO 4 (Zn 2+ ) & H 2 SO 4, SC1, SC2
RHOSONICS 기기
RHOSONICS Application TMAH KOH TMAH + PR HF NaOH
RHOSONICS Application - Line Test
RHOSONICS 초음파분석기장점 대부분의영역에사용가능 실시간측정장비 고온고압하에서의측정가능 Drift free 비접촉및비오염 정확하고높은재현성의보장 여러센서 ( 초음파, 전도도, 밀도, 온도등 ) 를이용하여다성분의분석이가능 다루기쉬운운용프로그램 시약이필요하지않음. 특별한유지관리의필요가없음. 센서의탈착이용이 하나의기기에여러보정치를입력하여선택하여측정가능 보정프로그램의교체가 PC 를이용하여간단하게수행 넓은온도범위에서의대응이가능
OLED 측정기기 - OPTEK Danulat Located in Germany Founded at 1984 Location - R&D (Germany) - Production (Germany) - Sales & Support (worldwide: Singapore, China ) Manufactures optical instruments for process control has experiences from more than 30,000 installations worldwide - Chemicals - Biotechnology - Semiconductor - Petro (Oil/Gas) optek-danulat, GmbH Essen Germany
OPTEK Controller - C2221
OPTEK Controller - C200 The CONTROL 200 is the all-round converter for continuous monitoring and control of ph and conductivity. The converter is intended to use with either one or two of the following optek sensors: PF12 (glass combination electrode) CF60 (6-electrode conductivity sensor)
OPTEK Sensors - AF 45 UV Absorption 저농도범위 고농도범위 0 ~ 0,05 CU 0 ~ 2 CU 온도범위 ( 표준센서 ) 적용분야 : Semiconductor 단백질농도 폐수오염측정 ( 유기물함유 ) HPLC 방향족화합물검출 ( 물중페놀분석 ) 0 ~ + 70 C +32 ~ +158 F 온도범위 ( 고온센서 ) HT - 20 ~ +120 C - 4 ~ +248 F
OPTEK Sensors - CF 60 Six - Electrode Conductivity (Patent) CS60 Conductivity sensor The ACF60 and CF60/CS60 six-electrode conductivity sensor has optimal positioning of four current electrodes around two potential electrodes providing a consistant and symmetrical excitation field. This patented design offers impressive precision and performance over anextremely wide measuring range and guarantees minimized sensitivity to sensor fouling and polarization. Additionally, the Pt1000 RTD integrated in the tip of the CF60 sensor provides responsive temperature compensation.
OPTEK Application - 반도체관련 Acetone Concentration Acetic Acid Concentration H2O2 (Gas & Liquid) Nitric Acid Concentration Surfactant Concentration TOC (SAC method) Chlorine Concentration Copper Concentration CIP Stream Constituent CMP Slurry Concentration Chemical Dosing Control Feed-water Contaminants Pre-Polishing Filter Control Metallic Contaminants Silica Concentration Cobalt Concentration Chromium Concentration Ultra Pure Water Control
OPTEK - C200 Conductivity KOH Calibration KOH Cal. 350 300 250 y = 99.297x + 5.6639 R 2 = 0.9984 ms 200 150 100 50 0 0 0.5 1 1.5 2 2.5 3 3.5 % KOH
OPTEK - C200 Conductivity KOH Optek 농도 Declination D 사농도 0.250% 0.200% 0.150% 0.100% 0.050% 0.000% -0.050% -0.100% -0.150% 11.08.31 11.09.01 11.09.01 11.09.01 11.09.02-0.113% -0.115% -0.115% -0.115% 0.001%0.002%0.002%0.001% 0.004% 0.001% 0.005% -0.002% 0.002% 0.001%0.002%0.001%0.002%0.001% 0.005% 0.002%0.002%0.001%0.002%0.002% 0.005% 0.001% 0.004% 0.003%0.004% 0.002% 0.001% 0.003%0.002%0.004%0.004% 0.004%0.003%0.002% 0.004% -0.002% -0.006% -0.005% -0.005%-0.006% -0.007% 11.09.03 11.09.03 11.09.04 11.09.04 11.09.04 11.09.05 11.09.05 11.09.06 11.09.06 11.09.07 11.09.07 11.09.08 11.09.08 11.09.08 11.09.09 11.09.09 11.09.10 11.09.10 11.09.10 11.09.11 11.09.11 11.09.13 11.09.14 11.09.15 11.09.15 11.09.16 11.09.16 11.09.17 11.09.18 11.09.20 11.09.20 11.09.21 11.09.22 11.09.22 11.09.23 11.09.23 11.09.24 11.09.24 11.09.24 11.09.25
OPTEK - C200 Conductivity TMAH Calibration