Microsoft PowerPoint - dev6_TCAD.ppt [호환 모드]

Similar documents
Microsoft PowerPoint - ch03ysk2012.ppt [호환 모드]

Microsoft PowerPoint - ch25ysk.pptx

Microsoft PowerPoint - analogic_kimys_ch10.ppt

Microsoft PowerPoint - ch07ysk2012.ppt [호환 모드]

-

歯coolingtower개요_1_.PDF

Chap3.SiliconOxidation.hwp

주요국 에너지 Profile 분석_아랍에미리트

< B4EBC7D0BBFDC8B0BEC8B3BB28C0DBBEF7292E687770>

105È£4fš

1 Nov-03 CST MICROWAVE STUDIO Microstrip Parameter sweeping Tutorial Computer Simulation Technology

What’s semiconductor?

(2) : :, α. α (3)., (3). α α (4) (4). (3). (1) (2) Antoine. (5) (6) 80, α =181.08kPa, =47.38kPa.. Figure 1.

2

<35335FBCDBC7D1C1A42DB8E2B8AEBDBAC5CDC0C720C0FCB1E2C0FB20C6AFBCBA20BAD0BCAE2E687770>

4.fm

歯동작원리.PDF

<30342DBCF6C3B3B8AEBDC3BCB33228C3D6C1BE292E687770>

< C6AFC1FD28B1C7C7F5C1DF292E687770>

Microsoft PowerPoint - ICCAD_Analog_lec01.ppt [호환 모드]

歯Trap관련.PDF

KEIT PD(15-10)-내지.indd


Service-Oriented Architecture Copyright Tmax Soft 2005

Microsoft PowerPoint - 전자물리특강-OLED-Driving

Microsoft Word - 1-차우창.doc

THE JOURNAL OF KOREAN INSTITUTE OF ELECTROMAGNETIC ENGINEERING AND SCIENCE Sep.; 30(9),

<31325FB1E8B0E6BCBA2E687770>

한국전지학회 춘계학술대회 Contents 기조강연 LI GU 06 초강연 김동욱 09 안재평 10 정창훈 11 이규태 12 문준영 13 한병찬 14 최원창 15 박철호 16 안동준 17 최남순 18 김일태 19 포스터 강준섭 23 윤영준 24 도수정 25 강준희 26

歯15-ROMPLD.PDF

13 Who am I? R&D, Product Development Manager / Smart Worker Visualization SW SW KAIST Software Engineering Computer Engineering 3

<313920C0CCB1E2BFF82E687770>

<4D F736F F F696E74202D F FB5BFBACEC7CFC0CCC5D820B1E8BFA9C8B22E BC8A3C8AF20B8F0B5E55D>

歯기구학

슬라이드 제목 없음

보고서(겉표지).PDF

THE JOURNAL OF KOREAN INSTITUTE OF ELECTROMAGNETIC ENGINEERING AND SCIENCE. vol. 28, no. 1, Jan GaN MMIC(Monolithic Microwave Integrated Circui

실적 및 전망 09년 하반 PECVD 고객 다변화에 따른 실적개선 10년 태양광 R&D 장비 매출을 반으로 본격적인 상업생산 시작 1. 09년 3Q 실적 동사는 09년 3Q에 매출과 영업이익으로 각각 142 억원(YoY 16.7%, QoQ 142%), 6 억원(흑전환)

2013<C724><B9AC><ACBD><C601><C2E4><CC9C><C0AC><B840><C9D1>(<C6F9><C6A9>).pdf

4세대가속기 건물사인

슬라이드 1

Energy Insights Vol. 1, No. 12

기능.PDF

도 1 명세서 도면의 간단한 설명 도 1은 본 발명의 바람직한 실시예에 따른 데이터 송수신 장치의 회로도이다. 도 2는 도 1에 도시된 등화기의 일 실시예를 보여주는 회로도이다. 도 3은 도 1에 도시된 프리엠퍼시스 회로의 일 실시예를 보여주는 회로도이다. 도 4는 본

PowerPoint 프레젠테이션

<4D F736F F D204954B1E2C8B9BDC3B8AEC1EE2DB0ADB9CEC8A3>

歯3이화진


PJTROHMPCJPS.hwp

Copyright by Korean Local-government Management Institute. ALL RIGHTS RESERVED. No part of this publication may be reproduced, stored in a retrieval s

18211.fm

THE JOURNAL OF KOREAN INSTITUTE OF ELECTROMAGNETIC ENGINEERING AND SCIENCE. vol. 26, no. 1, Jan 서론 PC PMIC(Power Management IC) [1]. PMIC DC-D

04_이근원_21~27.hwp

Manufacturing6

PowerPoint 프레젠테이션

ePapyrus PDF Document

# E-....b61.)

Microsoft PowerPoint - Ch8

,,,,,, (41) ( e f f e c t ), ( c u r r e n t ) ( p o t e n t i a l difference),, ( r e s i s t a n c e ) 2,,,,,,,, (41), (42) (42) ( 41) (Ohm s law),

<4D F736F F F696E74202D2028B9DFC7A5BABB2920C5C2BEE7B1A420B8F0B5E220C8BFC0B220BDC7C1F520BDC3BDBAC5DB5FC7D1B1B94E4920C0B1B5BFBFF85F F726C F72756D>

<30382E20B1C7BCF8C0E720C6EDC1FD5FC3D6C1BEBABB2E687770>

Journal of Educational Innovation Research 2017, Vol. 27, No. 3, pp DOI: (NCS) Method of Con

RC /07.12 RC / /6 2 3 / CA-08A-2N 2 CA-10A-2N 2 CA-12A-2N 2 CA-16A-2N 2 CA-20A-2N CA-08A-3N 4 CA-10A-3N 4 CA-12A-3N

Coriolis.hwp

DISPLAY CLASS Electronic Information Displays CRT Flat Panel Display Projection Emissive Display Non Emissive Display Cathode Ray Tube Light Valve FED

박선영무선충전-내지

(Vacuum) Vacuum)? `Vacua` (1 ) Gas molecular/cm 3

歯03-ICFamily.PDF

4 CD Construct Special Model VI 2 nd Order Model VI 2 Note: Hands-on 1, 2 RC 1 RLC mass-spring-damper 2 2 ζ ω n (rad/sec) 2 ( ζ < 1), 1 (ζ = 1), ( ) 1

161.시장동향보고서_멸균 서비스 시장.hwp

歯140김광락.PDF

Microsoft Word - IT부품정보.doc

[ 화학 ] 과학고 R&E 결과보고서 나노입자의표면증강을이용한 태양전지의효율증가 연구기간 : ~ 연구책임자 : 김주래 ( 서울과학고물리화학과 ) 지도교사 : 참여학생 : 원승환 ( 서울과학고 2학년 ) 이윤재 ( 서울과학고 2학년 ) 임종

00내지1번2번

GEAR KOREA

. 서론,, [1]., PLL.,., SiGe, CMOS SiGe CMOS [2],[3].,,. CMOS,.. 동적주파수분할기동작조건분석 3, Miller injection-locked, static. injection-locked static [4]., 1/n 그림

<C7D8BFDC5FB0E6BFB5C7F5BDC55FC4C1BCB3C6C35FBBE7B7CAC1FD28C0CFBABBC6ED292DC0DAB7E1BDC72E687770>

PowerPoint Presentation

슬라이드 1

CATIA V5 소개

KEEI ISSUE PAPER(Vol.1, No.6)

PowerPoint 프레젠테이션

<BBEABEF7B5BFC7E22DA5B12E687770>


10신동석.hwp

264 축되어 있으나, 과거의 경우 결측치가 있거나 폐기물 발생 량 집계방법이 용적기준에서 중량기준으로 변경되어 자료 를 활용하는데 제한이 있었다. 또한 1995년부터 쓰레기 종 량제가 도입되어 생활폐기물 발생량이 이를 기점으로 크 게 줄어들었다. 그러므로 1996년부

[발표자료]기업용모바일 활성화를 위한 제언(박종봉)

Orcad Capture 9.x

<353420B1C7B9CCB6F52DC1F5B0ADC7F6BDC7C0BB20C0CCBFEBC7D120BEC6B5BFB1B3C0B0C7C1B7CEB1D7B7A52E687770>

(p47~53)SR

THE JOURNAL OF KOREAN INSTITUTE OF ELECTROMAGNETIC ENGINEERING AND SCIENCE. vol. 26, no. 9, Sep GHz 10 W Doherty. [4]. Doherty. Doherty, C

슬라이드 1

KAERIAR hwp

논리회로설계 3 장 성공회대학교 IT 융합학부 1

<BCBCC1BEB4EB BFE4B6F72E706466>

歯4Q01_실적

SchoolNet튜토리얼.PDF

PowerPoint 프레젠테이션

THE JOURNAL OF KOREAN INSTITUTE OF ELECTROMAGNETIC ENGINEERING AND SCIENCE Jan.; 25(1), IS

제 07 장 Al and Cu Metallization.hwp

Transcription:

TCAD: SUPREM, PISCES 김영석 충북대학교전자정보대학 2012.9.1 Email: kimys@cbu.ac.kr k 전자정보대학김영석 1

TCAD TCAD(Technology Computer Aided Design, Technology CAD) Electronic design automation Process CAD Models process steps (diffusion, i I/I) => Simulates device structure (junction depth, doping profiles), e.g., SUPREM Device CAD Models devices based on fundamental physics (mobilities, doping profiles) => Simulates device behavior, e.g., PISCES Circuit it CAD Compact Modeling of the device (not based on fundamental physics) => Simulates circuit behavior, e.g., SPICE 전자정보대학김영석 2

TCAD From Wiki DFM: Design For Manufacturing, PSM: Phase Shift Masking CMP: Chemical Mechanical Planarization, STI: Shallow Trench Isolation 전자정보대학김영석 3

TCAD Work Flow http://www3.ntu.edu.sg/eee/eee6/lecturenotes/e425/index.htm 전자정보대학김영석 4

Process Simulation 전자정보대학김영석 5

Process Simulation Input - Grid Generation - Mask Definition - Structure Initialization - Process Step Spec. Models -Diffusion - Oxidation - Implantation ti - Deposition /masking /etching Output - Structure/Mesh - Doping profiles - Junction Depths 전자정보대학김영석 6

Process Simulators Process flow simulators are tools which simulate the full semiconductor manufacturing flow Process Simulators SUPREM3: 1-D, Standford Univ. SUPREM4: 2-D FEDSS: IBM PROPHET: AT&T DIOS: ISE (Swiss) TSUPREM4: commertial, based on SUPREM4 TAURUS-PROCESS ATHENA: commertial, based on SUPREM4 FLOOPS: U. of Florida Equipment Simulators ILLUM2D/3D: the Institute for Microelectronics at the Technical University of Vienna, lithography SPLAT/SAMPLE2D/3D, PROLITH, SOLID E, ACES http://www.iue.tuwien.ac.at/phd/minixhofer/node4.html 전자정보대학김영석 7

Summary of NMOS Process Flow 전자정보대학김영석 8

Layout TCAD Input Process Conditions Diffusion: Temp., Pressure, Time, Flow Rates Oxidation: Temp. Ramps, Gas Ramps Ion Implantation: Dose, Energy, Tilt, Revolving, Beam Div., Ionization Level 전자정보대학김영석 9

NMOS Process Simulations with TSUPREM4 Mesh Generation 전자정보대학김영석 10

Oxidation NMOS Process Simulations with TSUPREM4 전자정보대학김영석 11

NMOS Process Simulations with TSUPREM4 Nitride Deposition 전자정보대학김영석 12

NMOS Process Simulations with TSUPREM4 Nitride Etch 전자정보대학김영석 13

NMOS Process Simulations with TSUPREM4 Field Oxidation 전자정보대학김영석 14

NMOS Process Simulations with TSUPREM4 Nitride Remove 전자정보대학김영석 15

NMOS Process Simulations with TSUPREM4 Field Implant Profiles 전자정보대학김영석 16

NMOS Process Simulations with TSUPREM4 VTH Adjust Implant Profiles 전자정보대학김영석 17

NMOS Process Simulations with TSUPREM4 Before Gate Oxidation 전자정보대학김영석 18

NMOS Process Simulations with TSUPREM4 Gate Oxidation 전자정보대학김영석 19

NMOS Process Simulations with TSUPREM4 Polysilicon Gate Deposition 전자정보대학김영석 20

NMOS Process Simulations with TSUPREM4 Gate Poly Etch 전자정보대학김영석 21

NMOS Process Simulations with TSUPREM4 LDD and S/D Implant 전자정보대학김영석 22

NMOS Process Simulations with TSUPREM4 LDD Spacer Oxide Etch 전자정보대학김영석 23

NMOS Process Simulations with TSUPREM4 Metal Etch 전자정보대학김영석 24

Device Simulation 전자정보대학김영석 25

Device Simulation Input - Structure/Mesh - Doping Profiles - Structure Initialization - Process Step Spec. Basic Eqs. -Poission s i eq. - Continuity eq. - Drift-Diffusion Diffusion eq. Models - Rec-Gen - Mobility - F-D, Boltzmann Output - Structure/Mesh - Doping Profiles - Junction Depths 전자정보대학김영석 26

Device Simulators Generic Device Simulators PISCES 2ET: Standford Univ. FIELDAY PADRE MINIMOS-NT MEDICI: based on PISCES DESSIS ATLAS FLOODS Specialized Device Simulators MINIMOS: for MOSFET PISCES: for MOSFET, Standford Univ. SEQUOIA BIPOLE: for Bipolar 전자정보대학김영석 27

Initial Grid NMOS Device Simulations with MEDICI 전자정보대학김영석 28

Doping Regrid NMOS Device Simulations with MEDICI 전자정보대학김영석 29

NMOS Device Simulations with MEDICI Potential Regrid 전자정보대학김영석 30

NMOS Device Simulations with MEDICI Impurity Profiles 전자정보대학김영석 31

NMOS Device Simulations with MEDICI Impurity Contours 전자정보대학김영석 32

NMOS Device Simulations with MEDICI Gate Characteristics s 전자정보대학김영석 33

NMOS Device Simulations with MEDICI Drain Characteristics s 전자정보대학김영석 34

NMOS Device Simulations with MEDICI Drain Characteristics: s Potential Contours 전자정보대학김영석 35

NMOS Device Simulations with MEDICI Substrate Current 전자정보대학김영석 36

Gate Current NMOS Device Simulations with MEDICI 전자정보대학김영석 37

NMOS Device Simulations with MEDICI Drain Current Snapback 전자정보대학김영석 38

NMOS Device Simulations with MEDICI: Ex2 Definition of Mesh, Electrodes, Contacts 전자정보대학김영석 39

NMOS Device Simulations with MEDICI: Ex2 Doping Profiles 전자정보대학김영석 40

NMOS Device Simulations with MEDICI: Ex2 ID-Vg Curve 전자정보대학김영석 41