[ ] œwz, 21«2y(2008) J. of the Korean Society for Heat Treatment, Vol. 21, No. 2, (2008) pp. 94~100 Ti ball 이 coating 된임플란트 core 의제조 Á»Á Á Áqg vá ½ Á *Á½ **Á *** œ w lœw * w y lœw ** w» *** w œw The Fabrication of Implant Core Coated with Ti Balls D. J. Choi, D. G. Park, S. B. Park, S. S. Park, F. R. Turaev, J. S. Roh, S. J. Kim, H. S. Woo*, S. E. Kim**, J. H. Lee*** Department of Information and Nano Materials, Kumoh National Institute of Technology, Gumi 730-918, Korea *Department of Safety Environment Systems Engineering, Dongguk University, Gyeongju 780-714, korea **Korea Institute of Materials Science, Changwon 641-010, Korea ***Department of Advanced Materials Engineering, DongA University, Busan 604-714, Korea Abstract The implant prototypes with various porosities were fabricated by Spark Plasma Sintering of atomized spherical titanium balls. The interface was observed by optical microscope. Sintering temperature and holding time were selected at the point of big change of Z-axis ratio during sintering. These experiments show that Spark Plasma Sintering of spherical titanium balls can be efficiently used to produce implants surfaced with titanium balls with various porosities in a short time less than 120 seconds by manipulating the current condition such as z-axis, temperature and balls size. (Received February 18, 2008; accepted March 7, 2008) Key word: Implant, SPS(Spark Plasma Sintering), Titanium ball, Implant core 1. pk w ù w yw ey, w w jš w. w pk w k v w š š š, pk v p ƒ ww. v p e e l ¾ œe ü w e e» w w.» (Foreign body reaction) w š. ù Branemark [1] w pk w š š. x q e v p t ƒ j w w blasting, acid etching, plasma spray, w w v p w t e» ƒ š ƒ w jš. Deligianni [2] ñ t w t e pk ƒ s w š šw, Schwart [3] v p t e» s, y» x y j, t e»ƒ j w š šw. E-mail : sjghim@kumoh.ac.kr
Ti ball coating v p core 95 v p ƒœ» ƒœ mw t ù t y k screw-type v pƒ x š. v p ù w w» z œw e»» š w g. ù v p» š screw-type v p t { œ w e» k ã š š [4, 5, 6]. œ v p(porouslayered implant)» ƒœ screw-type v p t ¼ 3-4 t w 3» w š 4 v p š. œ t v p (Implant core) g y» w plasma spray sw z š j. p Ti y»» g w. w w» y š œ v p w. v p g x Ti ball z w -» m g œ v pƒ» w w v p w SPS(Spark Plasma Sintering) y j š š» w œ v p œ ƒ f š. SPS w w œ w w» w x Ti ball ƒ w 2 ü w œ t Ti ball gq g v p w, j» w y k w»œ v p wš w. v p v d w, - w Z-axis y w. w» v p g j», ball ball neck j», š»œ y w, SEM Ÿwx w œ v p w. 2. x 2.1 Ti ball Rotating electrode œ Ti x (Fluka Chemie AG) w xw. ball s³ 90 µm s³ 125 µm ƒ w,» 100 o C, 2 g w z x w. 2.2 Ball 15 mm, ü ƒƒ 4.0 mm, 3.3 mm v p core wš, j» ball ƒ ƒ e w 0.7 g w z vibrator w ball v p g w. SPS(Model SPS-1050, Sumitomo Coal Mining Co., Ltd Kanagawa, Japan) w 10kN w ƒwš,» ü Ar(96%) + H 2 (4%) ywƒ w w. w ƒƒ j» ball š,»œ» w 2 ƒ w w 900 o C 1150 o C x wš, ƒ 200 A/min w. Ti v p œ Fig. 1 ùkü, Fig. 2 Fig. 3 ü ball x, e ƒƒ ùkþ. 2.3 sƒ» v p v neck j», š w
96 Á»Á Á Áqg vá Á½ Á Á½ Á v p t kƒ yw w» w ƒƒ 2mm w SEM(Model S-2400, Hitachi, Ltd., Tokyo, Japan) Ÿwx w. w v p»œ ƒƒ j (Archimedes principle) w d w, ƒ v p»œ v w. w v p t ƒƒ v p t TiO 2 k v x» w EDS t d w, l input energy š w w. 3. x š 3.1 sƒ 3.1.1 - ƒ j w e. j» w. j»ƒ j (125 µm ) 1150 o C w š, (90 µm ) 950 o C w j w û w. ƒ Fig. 1. Flow Diagram of experimental procedure. Fig. 3. Insertion of Ti implant core and graphite pin into graphite mold. Fig. 2. Dimension of implant core and graphite mold.
Ti ball coating v p core 97 Fig. 4. Relation of variation of Z-axis versus applied current during sintering. j ball w k x ù» ball j ball w û z» w, š g w»œ š w ww. w, z j» w ƒ w š w š w. Fig. 5. Expansion-shrinking graph of Ti balls(125 µm) during sintering to 1150 o C. w w P φ, η Dƒ w» [7]. P φ =A exp( Q/kT) : -» η = η 0 exp(q/kt) :» D=D 0 exp( Q/kT) : š y» wù Fig. 4 q w ƒ 1400 A ù. q ë ƒ w m 3-5%. jš ƒ» ù., ƒ ù. w w» w ù», q w ƒ ƒ w dwš j» 950 o C 1150 o C w. Fig. 5 Fig. 6 ù», q ƒ w w w. wš x mw wš w. 3.1.2 w» w
98 Á»Á Á Áqg vá Á½ Á Á½ Á v p w» w x ww. wš, Fig. 7 950o C, 1100 o C 1150 o C w ƒw ƒ w ƒ w w, ƒ s f ƒ w 2 ùkû. Fig. 6. Expansion-shrinking graph of Ti balls (90 µm) during sintering to 950 o C. 4.1.3»œ y Fig. 8 j»ƒ 90 µm, 950 o C 2 Ti ball v p v t œ t x š. Fig. 9 j»ƒ 125 µm, 1150 o C 2 Ti ball gq core t ball ball, Fig. 7. Change of current during sintering; a) 1150 o C, b) 1100 o C and c) 950 o C.
Ti ball coating v p core 99 Fig. 8. Appearance of Ti ball(90 µm) sintered by spark plasma sintering. Table 1. Change of porosity of sintered balls with temperature Temperature ( o C) Porosity(%)-90 µm ball Porosity(%)-125 µm ball 8900 17.8 8950 25.5 1100 16 1150 21 4. Fig. 9. SEM image of core and Ti balls (125 µm) sintered by spark plasma sintering. ball core x x š. Table 1 ƒ Ti ball»œ ùkü, j» w ƒ»œ w ƒw ùkû, ù» ¾ ƒ q, j» pk ball w SPS ƒ Fig. 7 š ƒ ƒwš z q yƒ ú š ƒ 2 w», w ù k» j»œ, w j»œ œ v p w š ƒ. 1. pk ball Z q w kw, ƒ v 2 ƒ ù w ƒ w. 2. w x ƒ,»» w». 3.» w w w, w» w ƒ w w w. 4. x w x w œ ball. w w»œ œ v p w. 5. j» Ti ball w w»œ ƒ ùkû, ù» ¾
100 Á»Á Á Áqg vá Á½ Á Á½ Á ƒ q, j» pk ball w SPS ƒ ƒ š ƒ ƒwš z q yƒ ú, w ƒ 2», ball y ù k» d. Acknowledgement œ w (2005-104- 050) w w,. š x Prostheses, Chicago, Quintessence Punlishing Co. Inc., (1985) 29. 2. Deligianni, D. D., Katsala, N., Ladas, A. S., Sotiropoulou, D., Amedee, J. and Missirlis, Y. F. : Biomaterials, 22 (2001) 1241. 3. Schwarz, Z., Kieswetter, K., Dean, K. K. and Boyan, B. D. : J. Periodental Res., 32 (1997) 166. 4. D. Deporter, R. Pilliar, R. Todescan, P. Watson and M. Pharoah : Int, J. of Oral & maxillof. implants, 16 (2001) 653. 5. D. Deporter, P. Watson, M. Pharoah and R. Todescan : Clinical Oral Implants Res., 10 (1999) 95. 6. R. Nicula, F. Lüthen, M. Stir, B. Nebe and E. Burkel : Biomolecular Engineering, 24(5) (2007) 564-567. 7. D. L. Johnson and I. B. Cutler : J. Am. Ceram. Soc., 46(11) (1963) 541-550. 1. Branemark, P. I. : Introduction to Osseointegration. In Branemark PI, et al (Eds), Tissue Integrated