이온교환수지 목록표 Ion Exchange Resin Product List 판매원 : 경기도 성남시 분당구 구미동18 시그마2빌딩 D-303 Tel ( 代 ) 031-711-1560 Fax 031-711-1563 wwwionteccokr e-mail ion@ionteccokt 제조원 : 미쓰비시케미칼 삼양사
1975 Mitsubishi Chemical Corporation DIAION,,, Leading Maker,,,, LCD, Mitsubishi Chemical Corporation DIAION,,,, Brand, 13 ) Plant User Needs ) 2005 12 1 ST Stage 2 nd Stage Operating Capacity Calculation Process 3 rd Stage Process,,, Total Solution - Water Block Demineralizer - Packed Bed Demineralizer - Mixed Bed Demineralizer - Activated Carbon Media Tower - Softener - Feroxer(for Removing Fe, Mn) - Ultra Pure Water System - Pharmaceutical Demineralizer - Chromatography Separation - Starch Sugar Refining - Glycerin Refining - Amino acid Purification :, TEL)02-740-77327, e-mail) robin_hong@samyangcom Sample :, TEL)052-279-4774, e-mail) jhshim@samyangcom Sample :, TEL)032-651-5516, e-mail) ixresin@ixresincom - 2 -
(Contents) 1 Gel (Strongly Acidic Cation Exchange Resin Gel Type) SCR Series ----------------------------------------------------------------------------------------------------------- 2 Porous (Strongly Acidic Cation Exchange Resin Porous Type) CMP Series ----------------------------------------------------------------------------------------------------------- 3 Gel (Strongly Basic Anion Exchange Resin Gel Type) SAR Series ----------------------------------------------------------------------------------------------------------- 4 Porous (Strongly Basic Anion Exchange Resin Porous Type) AMP Series ----------------------------------------------------------------------------------------------------------- 5, (Weakly Acidic Cation, Weakly Basic Anion Exchange Resin High Porous Type) WK, AW, WA Series ------------------------------------------------------------------------------------------------ 6 (Strongly Acidic Cation Exchange Resin for Catalyst) SPC Series ----------------------------------------------------------------------------------------------------------- 7, (Uniform Particle Sized Resin, Resin for Layered Bed) UPS, LB --------------------------------------------------------------------------------------------------------------- 8 (Specialty Resin for Various Uses) SM210, KH80 -------------------------------------------------------------------------------------------------------- 9 (Chelating Resin) CR, Eporous Series ------------------------------------------------------------------------------------------------ 10 (Ion Exchange Resin For Ultra Pure Water) UPW Resin ----------------------------------------------------------------------------------------------------------- 11, (Filter Media for Iron & Manganese Removal) FEROX, RFC40 ----------------------------------------------------------------------------------------------------- 12 1, (Inert Resin) RMZ-3, TR70, PS20 ----------------------------------------------------------------------------------------------- 13 (Synthetic Adsorbent) HP, SP Series -------------------------------------------------------------------------------------------------------- 14 (Resins for Chromatographic Separation) UBK Series ----------------------------------------------------------------------------------------------------------- 15 (Appendix),, ----------------------------------------------------- 4page 5page 6page 7page 8page 9page 10page 12page 13page 14page 19page 19page 20page 22page 24page ), DIAION (Nomenclature of, DIAION) SCR Series : S(Strong), C(Cation), R(Resin) CMP Series : C(Cation), M(Macro) P(Porous) WK Series : W(Weak), K(Cation) SAR Series : S(Strong), A(Anion), R(Resin) AMP Series : A(Anion), M(Macro) P(Porous) AW, WA Series : A(Anion), W(Weak) MB : PSA(Polystyrene Sulfonic Acid, ) (Ex SAR10MB, SAR20MB, ) L : Large, 0312 L-Type 042512 (Ex SCR-BL, SAR20L, CMP28L, ) H, OH :, H, OH (Ex SCR-BH, SAR10OH, ) - 3 -
(Strongly Acidic Cation Exchange Resin Gel Type) (SCR series) Gel Type (Grade) SCR04 SCR-B SCR10 SCR12 (Matrix) (Functional group) (Ionic Form) (Specific Gravity) (Shipping Weight, g/) (Moisture Retention) (Total Capacity, eq/) (Effective Size, mm) (Uniformity Coefficient) (Operating Temp) ph (Operating ph Range) (Maximum Swelling, Na H ) DVB% ( ) PolystyreneDVB(Divinylbenzene) -SO 3 (Sulfonate) Na 116 129 132 137 780 825 845 855 5767 4350 3545 3242 12 20 20 21 040 16 0312 (on 1,180 < 5%, through 300 < 1%) 120 014 80% 80% 76% 60% 4% 8% 10% 12% (8%) (Remarks) Styrene Gel Type,,,,,, SCR-B : Gel Type,,,, Amino, SCR04 : Bisphenol-A, SCR10 : Condensate Polisher SCR12 : - 4 -
(Strongly Acidic Cation Exchange Resin Porous Type) (CMP series) Porous Type (Grade) CMP08 CMP12 CMP16 CMP20 CMP28 (Matrix) PolystyreneDVB (Functional group) (Ionic Form) (Specific Gravity) (Shipping Weight, g/) (Moisture Retention) (Total Capacity, eq/) (Effective Size, mm) (Uniformity Coefficient) (Operating Temp) ph (Operating ph Range) (Maximum Swelling, Na H ) DVB% ( ) -SO 3 (Sulfonate) Na 119 125 129 131 135 745 765 780 790 805 5868 5258 4652 4147 3743 12 15 18 19 22 040 16 0312 (on 1,180 < 5%, through 300 < 1%) 120 014 94% 95% 80% 78% 58% 4% 6% 8% 10% 14% (8%) (Remarks) Styrene Porous Type,,,, Macropore Gel Type Macropore Gel Type g Gel type CMP08 : Porous Type, CMP16 : Porous Type,, CMP28 : Porous Type, Condensate Polisher - 5 -
(Strongly Basic Anion Exchange Resin Gel Type) (SAR series) (Type1) (Type2) (Grade) SAR10 SAR11 SAR12 SAR20 SAR21 (Matrix) PolystyreneDVB PolystyreneDVB (Functional group) (Ionic Form) (Specific Gravity) (Shipping Weight, g/) (Moisture Retention) (Total Capacity, eq/) (Effective Size, mm) (Uniformity Coefficient) (Operating Temp) ph (Operating ph Range) (Maximum Swelling, Cl OH ) (Remarks) -N (CH 3 ) 3 Cl (Trimethylammonium) Cl -N (CH 3 ) 2 C 2 H 4 OH Cl (Dimethylethanolammonium) Cl 111 107 107 113 109 685 650 675 700 650 4347 5565 4855 3944 5565 13 085 13 13 08 040 040 16 16 0312 (on 1,180 < 5%, through 300 < 1%) 60 (OH ) 80 (Cl ) 014 40 (OH ) 60 (Cl ) 014 240% 346% 244% 116% 180% Styrene Gel type Styrene Gel type SiO 2, SiO 2 SAR10 : SiO 2 SAR20 : MBP (),, Amino SAR11 : SAR21 : SiO 2 Glutamine Amino SAR12 : SiO 2-6 -
(Strongly Basic Anion Exchange Resin Porous Type) (AMP series) (Type1) (Type2) (Grade) AMP14 AMP16 AMP18 TRILIE AMP24 AMP26 AMP28 (Matrix) PolystyreneDVB PolystyreneDVB (Functional group) (Ionic Form) (Specific Gravity) (Shipping Weight, g/) (Moisture Retention) (Total Capacity, eq/) (Effective Size, mm) (Uniformity Coefficient) (Operating Temp) ph (Operating ph Range) (Maximum Swelling, Cl OH ) DVB% ( ) (Remarks) -N (CH 3 ) 3 Cl (Trimethylammonium) Cl -N (CH 3 ) 2 C 2 H 4 OH Cl (Dimethylethanolammonium) Cl 106 108 110 109 111 112 655 670 680 655 680 690 5767 4955 4450 5464 4652 4046 10 12 13 09 11 13 040 040 16 16 0312 (on 1,180 < 5%, through 300 < 1%) 70 (OH ) 90 (Cl ) 014 50 (OH ) 70 (Cl ) 014 235% 230% 187% 138% 131% 117% 4% 6% 8% 4% 6% 8% Styrene Porous Type, Macropore Gel type,, SiO 2 Macropore Gel Type g, Gel Type AMP14 : Styrene Porous Type AMP24 : Styrene Porous Type,,,,, AMP16 : AMP26 : Condensate Polisher,,, Amino,,, Organic Scavenger AMP28 : Styrene Porous Type AMP18 : SiO 2 MBP,, - 7 -
(Weakly Acidic Cation, Weakly Basic Anion Exchange Resin High Porous Type) (WK, AW, WA series) (Grade) DIAION WK10 DIAION WK11 DIAION WK60L DIAION WA10 (WA11) DIAION WA20 AW90 (Matrix) (Functional group) (Ionic Form) (Specific Gravity) (Shipping Weight, g/) (Moisture Retention) (Total Capacity, eq/) (Effective Size, mm) (Uniformity Coefficient) (Operating Temp) ph (Operating ph Range) (Maximum Swelling) (H Na ) (OH Cl ) (Remarks) PolymethacrylateDVB -COOH (Carboxylic acid) H Polyacrylate DVB 115 116 116 615 665 800 5359 4552 4452 Polyacrylate DVB -(CH 2 ) n N(CH 3 ) 2 (Tertiary Amine) 105 (106) 650 (675) 6369 (5763) PolystyreneDVB -CH 2 NH(CH 2 CH 2 NH) n H(CH 2 ) 2 NH 2 (Secondary Amine) Free base -(CH 2 ) n N(CH 3 ) 2 (Tertiary Amine) 107 105 650 615 3945 4355 25 29 44 12 25 15 0312 (on 1,180 < 5%, through 300 < 1%) 040 035 040 16 16 150 120 042512 0312 (on 1,180 < 5%, through 300 < 1%) 60 (OH ) 514 414 09 500% 400% 500% 200% (200%) 100 (OH ) 300% 250% DIAION WK10 : Porous Type DIAION WA10 : DIAION WK11 WK10, WK11,,, Dextrose Beet Sugar Formalin DIAION WA20 : DIAION WK60L : High Porous Type, AW90 :,, Dextrose, Beet Sugar,, Formalin, Organic Scavenger - 8 -
(Strongly Acidic Cation Exchange Resin for Catalyst) (SPC series) (Grade) SPC160H SPC180H SPC320H SPC400H SPC600H (Matrix) PolystyreneDVB (Functional group) (Ionic Form) (Shipping Weight, g/) (Moisture Retention) (Total Capacity, eq/) (Effective Size, mm) (Uniformity Coefficient) (Operating Temp) ph (Operating ph Range) (Maximum Swelling, Na H ) (Remarks) -SO 3 (Sulfonate) H (H Conversion rate 995% ) 740 750 780 690 700 5460 5360 4248 6575 6065 15 15 19 10 12 040 16 0312 (on 1,180 < 5%, through 300 < 1%) 120 014 80% 80% 40% 100% 120% Styrene Porous Type CMP-Series (Porosity) Polymer Flexibility SPC160H Styrene Porous Type,,, CMP16 ESTER (Tetrahydrofuran) SPC180H Styrene Porous Type Ester (1,4 Butanediol, MMA), MTBE/TAME Etherification, Alkylation SPC320H Styrene Porous Type Cu, V 2 O 5 SPC400H Styrene Porous Type EHA(Ethylhexylacrylate) - 9 -
(Uniform Particle Sized Resin, Resin for Layered Bed) (UPS, LB series) (Grade) MC-1 MA-1 MA-2 AW90LB KA18LB (Matrix) PolystyreneDVB PolystyreneDVB (Functional group) (Ionic Form) (Specific Gravity) (Shipping Weight, g/) (Moisture Retention) (Total Capacity, eq/) (Uniformity Coefficient) (Operating Temp) ph (Operating ph Range) (Maximum Swelling) (Na H ) (Cl OH ) (Remarks) -SO 3 (Sulfonate) -N (CH 3 ) 3 Cl (Trimethylammonium) -N (CH 3 ) 2 OH (Dimethylam-monium) -N (CH 3 ) 3 Cl (Trimethylammonium) Na Cl Cl OH Cl 128 108 109 105 111 820 670 690 615 685 4248 5060 4252 4355 4347 20 13 13 15 13 11 11 11 12 14 059005 058005 057005 120 60 (OH ) 100 (Cl ) 35 (OH ) 70 (Cl ) 0506 (04072 95% ) 100 0612 60 (OH ) 80 (Cl ) 014 014 014 09 014 80% 240% 140% 300% (OH Cl ) -N (CH 3 ) 2 C 2 H 4 OH Cl (Dimethylethanolammonium) MC-1 AW90LB Gel Type Styrene- Porous Divinylbenzene Type 500600, AW90LB, KA18LB MA-1 Gel Type Styrene- SiO 2 % Divinylbenzene Trimethyl ammonium Water Block System Cl SiO 2 MBP,, Amino KA18LB MA-2 Gel Type Styrene- Gel Type Divinylbenzene Dimethylethanol ammonium 0612 TR Cl ILITE AW90LB Polishing Water Block System Performance Leakage SiO 2 Performance Packed Bed System 240% - 10 -
(Particle Size Distribution & Applications) Removal Conventional Resin L(Large) type Resin Uniform Particle Sized Resin 03 12mm 042512mm 16, 14 Water blocking Upflow system 0506 mm(90% ) 11 Packed bed system SAR-B SAR-BL MC1 SAR12 SAR12L - SAR10 SAR10L MA1 SAR20 SAR20L MA2 Middle distributor Service Regeneration Freeboard Ion exchange resin Freeboard Ion exchange resin Ion exchange resin Freeboard Freeboard Ion exchange resin Co-current regeneration system Counter-current regeneration system (Water blocking) Counter-current regeneration system (Upflow system) Packed bed Counter-current regeneration system - 11 -
(Specialty Resin for Various Uses) (SM, KH series & Others) (Grade) SM210 KH80 ASR16 NAC4 AMP26 (Matrix) PolystyreneDVB PolystyreneDVB PolystyreneDVB PolystyreneDVB (Functional group) (Ionic Form) (Shipping Weight, g/) (Moisture Retention) (Total Capacity, eq/) (Effective Size, mm) (Uniformity Coefficient) (Operating Temp) ph (Operating ph Range) (Maximum Swelling) (Na H ) (Cl OH ) (Remarks) Mixed Resin -SO 3 (Sulfonate) -N (CH 3 ) 3 Cl (Trimethylammonium) -SO 3 (Sulfonate) -N (CH 3 ) 2 C 2 H 4 OH Cl (Dimethylethanolammonium) H / OH Na Cl Na Cl 700 800 670 780 680 : 1) 4552 4955 5767 4652 045eq/ : 2) 50 20 12 12 11 040 050 040 045 045 16 14 16 155 16 0312 042512 50 120 0312 (on 1,180 < 5%, through 300 < 1%) 70 (OH ) 90 (Cl ) 0312 120 0312 50 (OH ) 70 (Cl ) 014 014 014 014 014-80% 230% 80% 131% SM210 ASR16 NAC-4 H Styrene DVB(Divinyl benzene) OH, Gel Type, Type Gel Type,,,, Wire-cutting Polisher, R/O Polisher, (DVB%) Polisher, KH80 Porous Type1 AMP-26, Macroporous Type Styrene-Divinylbenzene KH80 4 (Bad Life Time Odor) Premium Grade Porosity Organic Scavenger,, (1) - Na%=20%, : CaCO 3 400ppm + NaCl 100ppm, Flow rate : SV12, : 30 (2) 1) 20-12 -
(Chelating Resin) (CR, Eporous series) CR series Eporous series (Grade) DIAION CR11 DIAION CR20 DIAION CRB02 Eporous MX-8C Eporous Z-7 Eporous K-1(3) (Matrix) PolystyreneDVB Epoxy Resin (Functional group) CH 2 COONa -CH 2 N - CH 2 NH(C 2 H 4 NH) n H -(CH) 4 OHCH 2 OH CH 2 COONa Iminoacetate Polyamine Glucamine Imino Group Carboxylic Acid Imino Group Carboxylic Acid Imino Group Carboxylic Acid (Ionic Form) (Shipping Weight, g/) (Moisture Retention) (Total Capacity) (Effective Size, mm) (Uniformity Coefficient) (Operating Temp) ph (Operating ph Range) Na OH OH Ca 2 Na Al 3 (Na ) 730 685 635 788 810 780(725) 5565 5060 5060 3555 3550 Cu 2 05 (ph45, mmol/) Ca 2 035 (meq/) Cu 2 04 (ph40, mmol/) Acid 06 (meq/) 06mol Cd 2 /- Resin 550650g Hg /-Resin 4060 (3555) 11g F /-Resin (130g BF 4 /-R) 040 035 050 050 050(050) 16-0312 (on 1,180 < 5%, through 300 < 1%) 80 (H ) 120 (Na ) 15 100 (OH ) 100 (OH ) 0320(95%) 100 46 610 47 18 57(48) (Maximum Swelling) 300% (H Na ) 60% (OH Zn 2 ) - (Remarks) DIAION CR11 : Styrene Porous Type Eporous MX8C : (Cd, Pb, Zn, Cu, Ni, Cr, Chelation ), 2 (Zn, Cu, Ca, Fe,) ph Eporous Z-7 : (Hg) CR11 1 ph 2 01ppb 1 2 (NaOH) 2, DIAION CR20 : Styrene High Porous Type Eporous K-1 : (F ) Eporous K-3 : BF 4 BF 4 DIAION CRB02 : (Boric Acid) Eporous K-6 : 6-13 -
(Ion Exchange Resin For Ultra Pure Water) (UPW Resin) (Matrix) (Functional group) 1 TOC DIAION SKF110 PolystyreneDVB -SO 3 (Sulfonate) DIAION SKF110H (Ionic Form) Na H H (%, Conversion Rate) > 95 > 95 (Total Capacity, eq/) > 20 > 19 (Moisture Retention) 3545 4050 (>1,180 ) < 5% (>300 ) < 1% (>1,180 ) < 5% (>300 ) < 1% (Effective Size, mm) > 04 > 04 (Uniformity Coefficient) < 16 < 16 (Analytical Conditions) Regn, HCl=200g/-R Rinse, SV=30, 3hr Rinse, SV=30, 3hr TOC(ppb) < 50 < 50 (Remarks) 1 2 1 TOC DIAION SKF110 TOC 50ppb - 14 -
(Ion Exchange Resin For Ultra Pure Water) (UPW Resin) (Matrix) (Functional group) 1 TOC DIAION SAF12A DIAION SAF12AOH DIAION SAF10DL DIAION WA30C PolystyreneDVB -N (CH 3 ) 3 Cl (Trimethylammonium) -N (CH 3 ) 2 OH (Dimethylammonium) (Ionic Form) Cl OH Cl Free Base OH (%, Conversion Rate) > 90 > 90 > 90 > 95 (Total Capacity, eq/) > 12 > 09 > 13 > 15 (Moisture Retention) 4855 6272 3843 4355 (>1,180 ) < 5% (>300 ) < 1% (>1,180 ) < 5% (>425 ) < 5% (>1,180 ) < 5% (>300 ) < 1% (Effective Size, mm) > 04 > 04 > 04 > 04 (Uniformity Coefficient) < 16 < 16 < 16 < 16 (Analytical Conditions) Rinse, SV=30, 3hr Regn, NaOH=200g/-R Rinse, SV=30, 3hr Rinse, SV=30, 3hr TOC(ppb) < 50 < 50 < 50 < 50 (Remarks) 1 (Single Bed) 2 (Dual Layered Bed) DIAION SAF12A TOC DIAION SAF12AOH DIAION SAF12A DIAION SAF10DL( )DIAION WA30C( ) (Dual Layered Bed) TOC - 15 -
(Ion Exchange Resin For Ultra Pure Water) (UPW Resin) (Matrix) (Functional group) 1 (1 ST Polishing) DIAION SKNUP DIAION SANUP DIAION SMNUP -SO 3 (Sulfonate) PolystyreneDVB -N (CH 3 ) 3 Cl (Trimethylammonium) SKNUP, SANUP Mixed Resin (Ionic Form) H OH H / OH H, OH (%, Conversion Rate) > 990 > 900 - (Total Capacity, eq/) > 17 > 09 - (Moisture Retention) 5060 6272 - (>1,180 ) < 5% (>300 ) < 1% (>1,180 ) < 5% (>300 ) < 1% (>1,180 ) < 5% (>300 ) < 1% (Effective Size, mm) > 04 > 04 > 04 (Uniformity Coefficient) < 16 < 16 < 16 (Analytical Conditions) SKNUP, SANUP 1:1, 15,SV 123, 30min Service 15, SV 123, 30min Service Resistivity( ) > 15 > 15 > 15 TOC(ppb) - - Graph (Remarks) 1 TOC 2 10 DIAION SMNUP, SMT100 TOC 8 6 TOC ppb 4 DIAION SMNUP Condition Feed Water Quality Resistivity 182M cm TOC : 05 ppb Resin Volume : 500 Flow Rate : SV=30 2 0 DIAION SMT100 0 25 5 75 10 125 15 Service in hours - 16 -
(Ion Exchange Resin For Ultra Pure Water) (UPW Resin) (Matrix) (Functional group) 2 (2 ND Polishing) DIAION SKT10L DIAION SAT10L DIAION SMT100L -SO 3 (Sulfonate) PolystyreneDVB -N (CH 3 ) 3 Cl (Trimethylammonium) SKT10L, SAT10L Mixed Resin (Ionic Form) H OH H / OH H, OH (%, Conversion Rate) > 999 > 90, Cl% < 10 - (Total Capacity, eq/) > 19 > 09 - (Moisture Retention) 4050 6272 - (>1,180 ) < 5% (>425 ) < 1% (>1,180 ) < 5% (>425 ) < 1% (>1,180 ) < 5% (>425 ) < 1% (Effective Size, mm) > 04 > 04 > 04 (Uniformity Coefficient) < 16 < 16 < 16 (Analytical Conditions) Single Bed 15, SV 30, 3hr Service 15, SV 30, 3hr Service Resistivity( ) > 12 > 15 > 18 TOC(ppb) < 20 < 20 < 10 Na(ppt) < 05 < 05 ND Cl(ppt) < 05 < 05 ND (Remarks) 2 Final Polishing TOC Metal - 17 -
(Ion Exchange Resin For LCD Application) (UP Series) (Matrix) (Functional group) LCD TOC UPC100LH UPA100LOH UPM100L -SO 3 (Sulfonate) PolystyreneDVB -N (CH 3 ) 3 Cl (Trimethylammonium) UPC100LH, UPA100LOH Mixed Resin (Ionic Form) H OH H / OH H, OH (%, Conversion Rate) > 999 > 90, Cl% < 10 - (Total Capacity, eq/) > 19 > 09 - (Moisture Retention) 4050 6070 - (>1,180 ) < 5% (>425 ) < 1% (>1,180 ) < 5% (>425 ) < 1% (>1,180 ) < 5% (>425 ) < 1% (Effective Size, mm) > 04 > 04 > 04 (Uniformity Coefficient) < 15 < 15 < 15 (Analytical Conditions) UPC100LH, UPA100LOH 1:1, 15, 15,SV 123, 30min Service SV 123, 30min Service Resistivity( ) > 15 > 15 > 15 TOC(ppb) < 100 < 100 < 100 (Remarks) LCD 1 TOC 100ppb UPC100LH UPA100LOH UPM100L DIAION SMT100L - 18 -
(Filter Media for Iron & Manganese Removal) (FEROX, RFC40) (Grade) FEROX (Grade) RFC-40 (Matrix) Chamotte (Appearance) (Specific Gravity) (Uniformity Coefficient) 24 2550 1025 0516 17 (Ingredients) NaCl 90% Sodium Succinate 3% Sodium Citrate 3% Sodium Phosphorate 3% (Fe), (Mn) 15g Fe/ (Softening) (Inert Resin) (RMZ-3, TR70, PS20) 1 (Grade) RMZ-3 (Grade) TR70 DIAION PS20 (Matrix) Zeolite (Matrix) Polyethylene PolystyreneDVB (Shipping Weight, g/) 500 (Shipping Weight, g/) 500 700 ( 113115) 1933 1218 042084 ( 04, 13 ) (gas Na/) 1519 (Operating Temp) 90 90 2 1 1 (Na, K) ph (H 2 SO 4 ) Cost 1 Styrene, Up-Flow Up-Flow,,, - 19 -
(Synthetic Adsorbent) (HP, SP Series) Styrene Type Chemically Modified Styrene Type MethacrylateType (Grade) DIAION HP20 SEPABEADS SP825 SEPABEADS SP850 SEPABEADS SP700 SEPABEADS SP207 DIAION HP2MG CH 2 CH 2 (Chemical Structure) CH 2 CHCH 2 CH CH 2 CHCH 2 CH CH 2 CCH 2 C CO COOCH 2 O CH 2 CH Br CH 2 CH (CH 2 ) 2 O (Shipping Weight, g/) (Moisture Retention) 680 690 670 680 780 720 5565 5262 4652 6070 4353 5565 (Effective Size, mm) 025 030 (Uniformity Coefficient) 16 16 (Specific Surface Area) (/g) (Pore Volume, /g) 025 90% 030 90% 600 1,000 1,000 1,200 600 500 13 14 12 23 13 12 200300 5060 3545 8595 80120 200300 (Pore Radius, ) (Remarks) DIAION HP20, HP21 Styrene (> 1,000mw),, (ex Cepha-C),,, DIAION SP825, SP850 HP20 (1,000mw),,, DIAION SP700 SP Series,,, DIAION SP207 Styrene (Bromine) (Hydrophobicity) Styrene 12 DIAION HP2MG Matrix 10,000 BET - 20 -
(The Selection of Synthetic Adsorbent and Method of Use) (Aromatic Type) : HP Series (Pore) (Elution) (Aromatic Chemically modified Type) : SP200 Series (Aromatic Type) : SP800 Series (Specific surface area) HP Series sharp (Elution) (Methacrylic Type) : HPMG Series (Matrix) Adsorption Washing Elution Regeneration - 21 -
(Resins for Chromatographic Separation) (UBK Series) UBK Series HP, SP20SS (Grade) DIAION UBK530 DIAION UBK550 DIAION UBK555 DIAION HP20SS SEPABEADS SP20SS (Matrix) PolystyreneDVB PolystyreneDVB (Functional group) (Ionic Form) (Shipping Weight, g/) (Moisture Retention) (Total Capacity, eq/) -SO 3 (Sulfonate) - Na Na Ca 2-810 825 855 680 680 520555 460495 420460 5565 5565 16 19 20-02000240 85% 01900240 85% 0150 15% 01500063 70% 00750063 50% 0063 20% 0075 35% 0063 15% (Remarks) DIAION UBK Series, UBK555 11 Fructose/Glucose, Sucrose DIAION HP20SS, SEPABEADS SP20SS HP20SS HP20 75150 SP20SS HP20SS - 22 -
(Typical Corn Sugar Refining Process) Starch sources(corn, tapioca, ) Emulsion of starch Enzyme liquefaction Saccharification Intermediate concentration(evaporation) activated carbon Filtration 1 st Ion exchanger(2b2t+mb for glucose) SCR-B AW90 Countercurrent Cocurrent ph 56 5 / ph 89 20 / AMP24 CMP18 ph 46 2 / Bx 3540 CV Max 005 Glucose, GGl lluuccoossee, Maltose,,, Maal llt toossee, Corn,, CCoor rnn syrup ssyyr ruupp Evaporation Isomeration Activated carbon 2 nd 2Ion nd Ion exchanger(2b2t+mb for for fructose) SCR-B AW90 Countercurrent Cocurrent ph 56 5 / ph 89 20 / AMP24 CMP18 ph 46 2 / Bx 45 CV Max 005 HFS HHFFSS 42% 4422% Evaporation Fructose/glucose separation (8090% Glucose) DIAION UBK555 HFS 55% Mixing (9097% fructose) 3 rd Ion exchanger(mb for High fructose) AW90 AMP24 CMP18 ph 46 2 / Bx 40 CV Max 005 HFS HHFFSS 9097% 9900 9977% Evaporation - 23 -
(Cautions on Use of Ion Exchange Resins) (Handling),, (Ex ) (Storage) (Degradation) 0 (Disposal) SO X, NO X, CO X (Pretreatment Before Initial Use) Test Method (Loading) Column (Preparation of Regenerant) 35% HCl, 95% NaOH 1mol 35% HCl Volume 11, 95% NaOH 40g 1l (Injection of Regenerant) Down flow( ) SV(Space Velocity) (/hr) () 100 1 400 SV4 SV4 100% 80% 1mol ( HCl, NaOH) 5 10BV(Bed Volume) H, OH 80% 1mol ( HCl, NaOH) 5BV (Rinse) SV10 1 2 Commercial Plant Method Plant Manual, Process,,, ProcessColumn,
(The Method of Charging to the Vessel) (Single Bed) 1/3 LV 6 15m/h 15 1m 30 10 Sample (Double Regeneration) (Mixed Bed) (Mixed Bed), (Single Bed) Collector 2Type Level 1 Collector 5 2 10 Collector 2, Collector Collector 2 10 3 NaOH (Na, Na) Collector ( 5cm) (2 ) Collector Polisher (H) Collector, Collector Collector Collector
(The Method of Storage) Factor 50% (Osmotic Shock), (: Porous Type ) H-Type Na Ca Type, Cycle H Type Na Ca Type H Type Na Type OH Type (Styrene, Acrylic,, ) Cl Type Cl Type 40, ( ) Spray ( ) 12Bag 50 0 50 H OH Cl Cl 10% NaCl, 1/ 2 1 / 10% NaCl
(Applications of Ion Exchange Resin) Water Treatment System Application Process Ion Exchange Resin Domestic Softening KH80, SCR-B Softening SCR-B, DIAION WK60L Water Block System SCR-B, SAR20, SAR10 Packed Bed System MC1, MA2, MA1 Demineralization Layered Bed System SCR-B, AW90LB, KA18LB Mixed Bed Polishing System SCR-B, SAR10MB, MC1, MA1 Low TOC System DIAION SKF110, SAF12A, WA30C, RDA02 DIAION SKF110, SAF12A, WA30C, RDA02 Primary System Ultra Pure Water DIAION SKNUP, SANUP, SMNUP Secondary System DIAION SKT10, SAT10, SMT100 Condensate Polishing CMP28L, PS20, AMP16L Organic Scavenger AMP14 Cartridge Polishing SM210 Special Application Application Process Ion Exchange Resin Adipic acid CMP20, CMP28, SPC320H Alcohols SCR-B, SAR10, AW90 Amino acid, SCR-B, NAC4, AW90, AMP26 Boric acid DIAION CRB02 Brine 2 DIAION CR11 Caprolactam SCR-B, SAR10 Casein CMP28, CMP20 Catalysis SPC Series Cephalosporine, SCR-B, AW90, DIAION HPA25, HP Series, SP Series Chromates AMP28, AW90 Citric acid, CMP28, CMP20, AW90 Cobalt DIAION WA20, WA21, CR20 Colloidal Silica CMP28, WK60L Copper, CMP28, WK60L Electroplating effluents (recycling) CMP18, CMP20, AW90 Enzymes, DIAION HPA25, CR20 Formaldehyde, DIAION WA20, AW90, SAR12, CMP20 Gelatine CMP16, CMP28, AW90 Glucose CMP18, CMP28, AW90 Glucose-Fructose DIAION UBK555 Glycerine, CMP16, CMP18, AW90, AMP26, PA308 Lysine, SCR-B, DIAION SKL10 Mercury Eporous Z-7 Monosodium glutamate AW90, AMP26 Nucleic Acid, AMP26, NAC4, SAR21 Phenol AW90, DIAION HP Series Silver, gold SAR11, SAR10 Sorbitol CMP18, CMP28, AW90, AMP24 Sucrose + SCR-B Sugar Refining AMP14, SAR11 Sugar Refining DIAION UBK530 Xylitol SCR-B, AW90, WK60L, AMP26